PMID- 14982433
OWN - NLM
STAT- PubMed-not-MEDLINE
DCOM- 20040519
LR  - 20080117
IS  - 0002-7863 (Print)
IS  - 0002-7863 (Linking)
VI  - 126
IP  - 8
DP  - 2004 Mar 3
TI  - Solvent-resistant photocurable liquid fluoropolymers for microfluidic device 
      fabrication [corrected].
PG  - 2322-3
AB  - We report the first fabrication of a solvent-compatible microfluidic device based 
      on photocurable "Liquid Teflon" materials. The materials are highly fluorinated 
      functionalized perfluoropolyethers (PFPEs) that have liquidlike viscosities that 
      can be cured into tough, highly durable elastomers that exhibit the remarkable 
      chemical resistance of fluoropolymers such as Teflon. Poly(dimethylsiloxane) 
      (PDMS) elastomers have rapidly become the material of choice for many recent 
      microfluidic device applications. Despite the advantages of PDMS in relation to 
      microfluidics technology, the material suffers from a serious drawback in that it 
      swells in most organic solvents. The swelling of PDMS-based devices in organic 
      solvents greatly disrupts the micrometer-sized features and makes it impossible 
      for fluids to flow inside the channels. Our approach to this problem has been to 
      replace PDMS with photocurable perfluoropolyethers. Device fabrication and valve 
      actuation were accomplished using established procedures for PDMS devices. The 
      additional advantage of photocuring allows fabrication time to be decreased from 
      several hours to a matter of minutes. The PFPE-based device exhibited mechanical 
      properties similar to those of Sylgard 184 before and after curing as well as 
      remarkable resistance to organic solvents. This work has the potential to expand 
      the field of microfluidics to many novel applications.
FAU - Rolland, Jason P
AU  - Rolland JP
AD  - Department of Chemistry, University of North Carolina at Chapel Hill, Chapel 
      Hill, North Carolina, 27599, USA.
FAU - Van Dam, R Michael
AU  - Van Dam RM
FAU - Schorzman, Derek A
AU  - Schorzman DA
FAU - Quake, Stephen R
AU  - Quake SR
FAU - DeSimone, Joseph M
AU  - DeSimone JM
LA  - eng
PT  - Journal Article
PL  - United States
TA  - J Am Chem Soc
JT  - Journal of the American Chemical Society
JID - 7503056
EIN - J Am Chem Soc. 2004 Jul 7;126(26):8349
EDAT- 2004/02/26 05:00
MHDA- 2004/02/26 05:01
CRDT- 2004/02/26 05:00
PHST- 2004/02/26 05:00 [pubmed]
PHST- 2004/02/26 05:01 [medline]
PHST- 2004/02/26 05:00 [entrez]
AID - 10.1021/ja031657y [doi]
PST - ppublish
SO  - J Am Chem Soc. 2004 Mar 3;126(8):2322-3. doi: 10.1021/ja031657y.