PMID- 15739203
OWN - NLM
STAT- MEDLINE
DCOM- 20050517
LR  - 20061115
IS  - 1527-8999 (Print)
IS  - 1528-0691 (Linking)
VI  - 4
IP  - 6
DP  - 2004
TI  - Creation of highly functional thin films using electrochemical nanotechnology.
PG  - 346-62
AB  - This overview describes the results of our recent study of the application of 
      electrochemical nanotechnology to the fabrication of magnetic recording 
      materials, interconnects in ultra-large-scale integrated (ULSI) devices, energy 
      storage materials, and on-chip biosensors. It is important to note that 
      electrochemical processes play significant roles in developing and fabrication 
      such sophisticated materials and devices. In the field of magnetic recording, 
      electrodeposition methods for preparing CoNiFe and CoFe soft magnetic thin films 
      with a high saturation magnetic flux density were newly developed, and the 
      significant issues for obtaining those films are highlighted. In the area of ULSI 
      interconnects, we developed a technique using a self-assembled monolayer (SAM) 
      for direct bonding of the interconnect layer to SiO2, and proposed a novel 
      electroless deposition method for fabricating a diffusion barrier layer. In the 
      field of batteries, electrodeposited SnNi alloy was proposed as a future anode 
      material for Li batteries, and electrochemical MEMS processes were shown to be 
      useful for fabricating micro-sized direct methanol fuel cells (DMFCs) as portable 
      batteries for electronics applications. In the area of chemical sensors, we 
      developed a new process for fabricating field effect transistors (FETs) modified 
      with SAMs for on-chip biosensing applications.
FAU - Osaka, Tetsuya
AU  - Osaka T
AD  - Department of Nano-Science and Nano-Engineering, Graduate School of Science and 
      Engineering, Waseda University, 3-4-1 Okubo, Tokyo 169-8555, Japan. 
      osakatet@waseda.jp
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
PT  - Review
PL  - United States
TA  - Chem Rec
JT  - Chemical record (New York, N.Y.)
JID - 101085550
RN  - 0 (Membranes, Artificial)
RN  - 0 (Metals)
RN  - 0 (Organometallic Compounds)
SB  - IM
MH  - Biosensing Techniques/instrumentation/methods
MH  - Electrochemistry
MH  - Information Storage and Retrieval
MH  - Magnetics
MH  - Membranes, Artificial
MH  - Metals/chemistry
MH  - Nanotechnology/*methods
MH  - Organometallic Compounds/chemistry
MH  - Surface Properties
RF  - 157
EDAT- 2005/03/02 09:00
MHDA- 2005/05/18 09:00
CRDT- 2005/03/02 09:00
PHST- 2005/03/02 09:00 [pubmed]
PHST- 2005/05/18 09:00 [medline]
PHST- 2005/03/02 09:00 [entrez]
AID - 10.1002/tcr.20025 [doi]
PST - ppublish
SO  - Chem Rec. 2004;4(6):346-62. doi: 10.1002/tcr.20025.