PMID- 16351210
OWN - NLM
STAT- MEDLINE
DCOM- 20060123
LR  - 20200930
IS  - 1530-6984 (Print)
IS  - 1530-6984 (Linking)
VI  - 5
IP  - 12
DP  - 2005 Dec
TI  - Additive soft-lithographic patterning of submicrometer- and nanometer-scale 
      large-area resists on electronic materials.
PG  - 2533-7
AB  - We describe a novel soft-lithographic technique possessing broad utility for the 
      fabrication of large area, nanoscale ( approximately 100 nm) multilayer resist 
      structures on electronic material substrates. This additive patterning method 
      transfers ultrathin poly(dimethylsiloxane) (PDMS) decals to an underlying 
      SiO(2)-capped organic planarazation layer. The PDMS patterns serve as a latent 
      image through which high-quality multilayer resist structures can be developed 
      using reactive ion-beam etching.
FAU - Ahn, Heejoon
AU  - Ahn H
AD  - Department of Chemistry, Beckman Institute and Frederick Seitz Materials Research 
      Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA.
FAU - Lee, Keon Jae
AU  - Lee KJ
FAU - Shim, Anne
AU  - Shim A
FAU - Rogers, John A
AU  - Rogers JA
FAU - Nuzzo, Ralph G
AU  - Nuzzo RG
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
PT  - Research Support, U.S. Gov't, Non-P.H.S.
PL  - United States
TA  - Nano Lett
JT  - Nano letters
JID - 101088070
RN  - 0 (Dimethylpolysiloxanes)
RN  - 0 (Membranes, Artificial)
RN  - 0 (Silicones)
RN  - 63148-62-9 (baysilon)
RN  - 7631-86-9 (Silicon Dioxide)
SB  - IM
MH  - Crystallization/*methods
MH  - Dimethylpolysiloxanes/*chemistry
MH  - *Electronics
MH  - Membranes, Artificial
MH  - Miniaturization/methods
MH  - Nanostructures/*chemistry/*ultrastructure
MH  - Nanotechnology/methods
MH  - Particle Size
MH  - Photography/*methods
MH  - Silicon Dioxide/*chemistry
MH  - Silicones/*chemistry
MH  - Surface Properties
EDAT- 2005/12/15 09:00
MHDA- 2006/01/24 09:00
CRDT- 2005/12/15 09:00
PHST- 2005/12/15 09:00 [pubmed]
PHST- 2006/01/24 09:00 [medline]
PHST- 2005/12/15 09:00 [entrez]
AID - 10.1021/nl051894u [doi]
PST - ppublish
SO  - Nano Lett. 2005 Dec;5(12):2533-7. doi: 10.1021/nl051894u.