PMID- 16768534
OWN - NLM
STAT- PubMed-not-MEDLINE
DCOM- 20070720
LR  - 20060613
IS  - 0743-7463 (Print)
IS  - 0743-7463 (Linking)
VI  - 22
IP  - 13
DP  - 2006 Jun 20
TI  - Ink dependence of poly(dimethylsiloxane) contamination in microcontact printing.
PG  - 5945-51
AB  - Poly(dimethylsiloxane) (PDMS) is the most widely used stamp material in 
      microcontact printing. It has excellent properties with respect to versatility, 
      chemical inertness, and mechanical stability. However, it has an inclination to 
      contaminate printed substrates with low molecular weight siloxane fragments. In 
      this study, it is shown, by a combination of lateral force microscopy, Fourier 
      transform infrared spectroscopy, and X-ray photoelectron spectroscopy, that the 
      extent of the PDMS-induced contamination is dependent on the nature of the ink 
      used. The highest degree of contamination was found for relatively polar inks, 
      whereas apolar alkanethiol inks were found to shield the substrate from 
      contamination. This is interpreted in terms of the contaminating species being 
      polar in nature.
FAU - Sharpe, Ruben B A
AU  - Sharpe RB
AD  - MESA+ Institute for Nanotechnology and Faculty of Science and Technology, 
      University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.
FAU - Burdinski, Dirk
AU  - Burdinski D
FAU - van der Marel, Cees
AU  - van der Marel C
FAU - Jansen, Jan A J
AU  - Jansen JA
FAU - Huskens, Jurriaan
AU  - Huskens J
FAU - Zandvliet, Harold J W
AU  - Zandvliet HJ
FAU - Reinhoudt, David N
AU  - Reinhoudt DN
FAU - Poelsema, Bene
AU  - Poelsema B
LA  - eng
PT  - Journal Article
PL  - United States
TA  - Langmuir
JT  - Langmuir : the ACS journal of surfaces and colloids
JID - 9882736
EDAT- 2006/06/14 09:00
MHDA- 2006/06/14 09:01
CRDT- 2006/06/14 09:00
PHST- 2006/06/14 09:00 [pubmed]
PHST- 2006/06/14 09:01 [medline]
PHST- 2006/06/14 09:00 [entrez]
AID - 10.1021/la053298l [doi]
PST - ppublish
SO  - Langmuir. 2006 Jun 20;22(13):5945-51. doi: 10.1021/la053298l.