PMID- 16831018
OWN - NLM
STAT- MEDLINE
DCOM- 20070816
LR  - 20081121
IS  - 0743-7463 (Print)
IS  - 0743-7463 (Linking)
VI  - 22
IP  - 15
DP  - 2006 Jul 18
TI  - Microscale features and surface chemical functionality patterned by electron beam 
      lithography: a novel route to poly(dimethylsiloxane) (PDMS) stamp fabrication.
PG  - 6712-8
AB  - Poly(dimethylsiloxane) (PDMS) has become a ubiquitous material for microcontact 
      printing, yet there are few methods available to pattern a completed PDMS stamp 
      in a single step. It is shown here that electron beam lithography (EBL) is 
      effective in writing patterns directly onto cured PDMS stamps, thus overcoming 
      the need for multiple patterning steps. Not only does this method allow the 
      modification of an existing lithographic pattern, but new 3D features such as 
      cones, pits, and channels can also be fabricated. EBL can also be used to 
      fabricate PDMS masks for photolithography whereby 1:1 pattern transfer into a 
      photoresist is achieved. Additionally, direct EBL writing of surface chemical 
      features has been achieved using a PDMS stamp coated with a self-assembled 
      monolayer. An electrostatic mechanism appears to be operative in the EBL 
      patterning process, as supported by calculations, thermogravimetric analysis, 
      time-of-flight secondary ion mass spectroscopy, optical and atomic force 
      microscopy, and chemical functionalization assays.
FAU - Russell, Matthew T
AU  - Russell MT
AD  - Department of Chemistry and Department of Materials Science and Engineering, 
      Northwestern University, Evanston, IL 60208, USA.
FAU - Pingree, Liam S C
AU  - Pingree LS
FAU - Hersam, Mark C
AU  - Hersam MC
FAU - Marks, Tobin J
AU  - Marks TJ
LA  - eng
PT  - Journal Article
PL  - United States
TA  - Langmuir
JT  - Langmuir : the ACS journal of surfaces and colloids
JID - 9882736
RN  - 0 (Dimethylpolysiloxanes)
RN  - 0 (Silicones)
RN  - 63148-62-9 (baysilon)
SB  - IM
MH  - Dimethylpolysiloxanes/*chemistry
MH  - *Electrons
MH  - Materials Testing
MH  - Microscopy, Atomic Force/methods
MH  - Nanotechnology/*methods
MH  - Sensitivity and Specificity
MH  - Silicones/*chemistry
MH  - Static Electricity
MH  - Surface Properties
EDAT- 2006/07/13 09:00
MHDA- 2007/08/19 09:00
CRDT- 2006/07/13 09:00
PHST- 2006/07/13 09:00 [pubmed]
PHST- 2007/08/19 09:00 [medline]
PHST- 2006/07/13 09:00 [entrez]
AID - 10.1021/la060319i [doi]
PST - ppublish
SO  - Langmuir. 2006 Jul 18;22(15):6712-8. doi: 10.1021/la060319i.