PMID- 17107021
OWN - NLM
STAT- MEDLINE
DCOM- 20070313
LR  - 20131121
IS  - 0743-7463 (Print)
IS  - 0743-7463 (Linking)
VI  - 22
IP  - 24
DP  - 2006 Nov 21
TI  - Design of experiment for optimization of plasma-polymerized octafluorocyclobutane 
      coating on very high aspect ratio silicon molds.
PG  - 10196-203
AB  - As-fabricated deep reactive ion etched (DRIE) silicon mold with very high aspect 
      ratio (>10) feature patterns is unsuitable for poly(dimethylsiloxane) (PDMS) 
      replication because of the strong interaction between the Si surface and the 
      replica and the corrugated mold sidewalls. The silicon mold can be conveniently 
      passivated via plasma polymerization of octafluorocyclobutane (C4F8), which is 
      also employed in the DRIE process itself, to enable the mold to be used 
      repeatedly. To optimize the passivation conditions, we have undertaken a 
      Box-Behnken experimental design on the basis of three passivation process 
      parameters (plasma power, C4F8 flow rate, and deposition time). The measured 
      responses were fluorinated film thickness, demolding status/success, demolding 
      force, and fluorine/carbon ratio on the fifth replica surface. The optimal 
      passivation process conditions were predicted to be an input power of 195 W, a 
      C4F8 flow rate of 57 sccm, and a deposition time of 364 s; these were verified 
      experimentally to have high accuracy. Demolding success requires medium-deposited 
      film thickness (66-91 nm), and the thickness of the deposited films correlated 
      strongly with deposition time. At moderate to high ranges, increased plasma power 
      or gas flow rate promoted polymerization over reactive etching of the film. It 
      was also found that small quantities of the fluorinated surface were transferred 
      from the Si mold to the PDMS at each replication, entailing progressive wear of 
      the fluorinated layer.
FAU - Yeo, L P
AU  - Yeo LP
AD  - The Singapore-MIT Alliance, Innovation in Manufacturing Systems and Technology 
      Program, School of Chemical and Biomedical Engineering, and School of Mechanical 
      and Aerospace Engineering, Nanyang Technological University, Singapore, 
      Singapore.
FAU - Yan, Y H
AU  - Yan YH
FAU - Lam, Y C
AU  - Lam YC
FAU - Chan-Park, Mary B
AU  - Chan-Park MB
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
PL  - United States
TA  - Langmuir
JT  - Langmuir : the ACS journal of surfaces and colloids
JID - 9882736
RN  - 0 (Biocompatible Materials)
RN  - 0 (Chlorofluorocarbons)
RN  - 0 (Chlorofluorocarbons, Methane)
RN  - 0 (Coated Materials, Biocompatible)
RN  - 0 (Dimethylpolysiloxanes)
RN  - 0 (Nylons)
RN  - 0 (poly(dimethylsiloxane)-polyamide copolymer)
RN  - 284SYP0193 (Fluorine)
RN  - V9P1D0A21K (octafluorocyclobutane)
RN  - Z4152N8IUI (Silicon)
SB  - IM
MH  - Biocompatible Materials/*chemistry
MH  - Chlorofluorocarbons
MH  - Chlorofluorocarbons, Methane/*chemistry
MH  - Coated Materials, Biocompatible/chemistry
MH  - Dimethylpolysiloxanes/chemistry
MH  - Equipment Design
MH  - Fluorine/chemistry
MH  - Microscopy, Electron, Scanning
MH  - Models, Statistical
MH  - Models, Theoretical
MH  - Nylons/chemistry
MH  - Silicon/*chemistry
MH  - Spectrometry, X-Ray Emission
MH  - *Surface Properties
EDAT- 2006/11/17 09:00
MHDA- 2007/03/14 09:00
CRDT- 2006/11/17 09:00
PHST- 2006/11/17 09:00 [pubmed]
PHST- 2007/03/14 09:00 [medline]
PHST- 2006/11/17 09:00 [entrez]
AID - 10.1021/la061334q [doi]
PST - ppublish
SO  - Langmuir. 2006 Nov 21;22(24):10196-203. doi: 10.1021/la061334q.