PMID- 17654987
OWN - NLM
STAT- MEDLINE
DCOM- 20070907
LR  - 20190715
IS  - 1533-4880 (Print)
IS  - 1533-4880 (Linking)
VI  - 7
IP  - 6
DP  - 2007 Jun
TI  - Nanocrystalline SnO2 formation using energetic ion beam.
PG  - 2036-40
AB  - Nanocrystalline tin oxide (SnO2) thin films grown by RF magnetron sputtering 
      technique were characterized by UV-Visible absorption spectroscopy and 
      Photoluminescence spectroscopy. From atomic force microscopic (AFM) and Glancing 
      angle X-ray diffraction (GAXRD) measurements, the radius of grains was found to 
      be approximately 6+/-2 nm. The thin films were bombarded with 250 keV Xe2+ ion 
      beam to observe the stability of nanophases against radiation. For ion bombarded 
      films, optical absorption band edge is shifted towards red region. Atomic force 
      microscopy studies show that the radius of the grains was increased to 
      approximately 8 +/- 1 nm and the grains were nearly uniform in size. The size of 
      the grains has been reduced after ion bombardment in the case of films grown on 
      Si. During this process, defects such as vacancies, voids were generated in the 
      films as well as in the substrates. Ion bombardment induces local temperature 
      increase of thin films causing melting of films. Ion beam induced defects 
      enhances the diffusion of atoms leading to uniformity in size of grains. The role 
      of matrix on ion beam induced grain growth is discussed.
FAU - Mohanty, T
AU  - Mohanty T
AD  - School of Physical Sciences, Jawaharlal Nehru University, New Delhi 110067, 
      India.
FAU - Batra, Y
AU  - Batra Y
FAU - Tripathi, A
AU  - Tripathi A
FAU - Kanjilal, D
AU  - Kanjilal D
LA  - eng
PT  - Journal Article
PL  - United States
TA  - J Nanosci Nanotechnol
JT  - Journal of nanoscience and nanotechnology
JID - 101088195
RN  - 0 (Macromolecular Substances)
RN  - 0 (Tin Compounds)
RN  - KM7N50LOS6 (stannic oxide)
SB  - IM
MH  - Crystallization/*methods
MH  - Heavy Ions
MH  - *Luminescent Measurements
MH  - Macromolecular Substances/chemistry/radiation effects
MH  - Materials Testing
MH  - Molecular Conformation/radiation effects
MH  - Nanostructures/*chemistry/radiation effects/*ultrastructure
MH  - Nanotechnology/*methods
MH  - Particle Size
MH  - Semiconductors
MH  - Surface Properties/radiation effects
MH  - Tin Compounds/*chemistry/*radiation effects
EDAT- 2007/07/28 09:00
MHDA- 2007/09/08 09:00
CRDT- 2007/07/28 09:00
PHST- 2007/07/28 09:00 [pubmed]
PHST- 2007/09/08 09:00 [medline]
PHST- 2007/07/28 09:00 [entrez]
AID - 10.1166/jnn.2007.764 [doi]
PST - ppublish
SO  - J Nanosci Nanotechnol. 2007 Jun;7(6):2036-40. doi: 10.1166/jnn.2007.764.