PMID- 19756241
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20211020
IS  - 0142-2421 (Print)
IS  - 0142-2421 (Linking)
VI  - 41
IP  - 8
DP  - 2009 Mar 18
TI  - Surface Analysis of Photolithographic Patterns using ToF-SIMS and PCA.
PG  - 645-652
AB  - Time-of-flight secondary ion mass spectrometry (ToF-SIMS) is a surface analysis 
      technique well-suited to detect and identify trace surface species. With the 
      latest analyzers, ion sources and data analysis methods, imaging ToF-SIMS 
      provides detailed 2-D and 3-D surface reactivity maps. Coupling multivariate 
      analysis methods such as principal component analysis (PCA) with ToF-SIMS 
      provides a powerful method for differentiating spatial regions with different 
      chemistries. ToF-SIMS and PCA are used in this study to image and analyze a 
      two-component photolithograph-patterned surface chemistry currently published and 
      commercialized for bioassays, bio-chips and cell-based biosensors. A widely used 
      reactive surface coupling chemistry, N-hydroxysuccinimide (NHS), and 
      2-methoxyethylamine (MeO) were co-patterned into adjacent regions on a commercial 
      microarray polymer coating using standard photolithography methods involving 
      deposition, patterning and removal of a routinely used photoresist material. 
      After routine processing, ToF-SIMS and PCA of the patterned surface revealed 
      significant residual photoresist material remaining at the interface of the 
      NHS/MeO patterns, as well as lower concentrations of residual photoresist 
      material remaining within the MeO-containing regions, providing spatial mapping 
      and residue analysis not evident from other characterization techniques. As 
      detection of surface photoresist residue remains an inherent challenge in 
      photolithographic processing of a wide array of materials, the use of ToF-SIMS 
      coupled with PCA is shown to be a high-resolution characterization tool with the 
      high sensitivity and specificity required for surface quality control 
      measurements following photolithography and pattern development relevant to many 
      current processes.
FAU - Dubey, Manish
AU  - Dubey M
AD  - National ESCA and Surface Analysis Center for Biomedical Problems, Box 351750, 
      University of Washington, Seattle, WA 98195-1750 USA.
FAU - Emoto, Kazunori
AU  - Emoto K
FAU - Cheng, Fang
AU  - Cheng F
FAU - Gamble, Lara J
AU  - Gamble LJ
FAU - Takahashi, Hironobu
AU  - Takahashi H
FAU - Grainger, David W
AU  - Grainger DW
FAU - Castner, David G
AU  - Castner DG
LA  - eng
GR  - P41 EB002027/EB/NIBIB NIH HHS/United States
GR  - P41 EB002027-24/EB/NIBIB NIH HHS/United States
GR  - R01 EB001473/EB/NIBIB NIH HHS/United States
GR  - R01 EB001473-05/EB/NIBIB NIH HHS/United States
PT  - Journal Article
PL  - England
TA  - Surf Interface Anal
JT  - Surface and interface analysis : SIA
JID - 101479368
PMC - PMC2743017
MID - NIHMS133296
EDAT- 2009/09/17 06:00
MHDA- 2009/09/17 06:01
PMCR- 2009/09/14
CRDT- 2009/09/17 06:00
PHST- 2009/09/17 06:00 [entrez]
PHST- 2009/09/17 06:00 [pubmed]
PHST- 2009/09/17 06:01 [medline]
PHST- 2009/09/14 00:00 [pmc-release]
AID - 10.1002/sia.3056 [doi]
PST - ppublish
SO  - Surf Interface Anal. 2009 Mar 18;41(8):645-652. doi: 10.1002/sia.3056.