PMID- 19946167
OWN - NLM
STAT- PubMed-not-MEDLINE
DCOM- 20100324
LR  - 20091130
IS  - 1361-6528 (Electronic)
IS  - 0957-4484 (Linking)
VI  - 21
IP  - 1
DP  - 2010 Jan 8
TI  - Collapse behavior and forces of multistack nanolines.
PG  - 015708
LID - 10.1088/0957-4484/21/1/015708 [doi]
AB  - Two types of multistack nanolines (MNLs), Si-substrate (Si)/siliconoxynitride 
      (SiON)/amorphous Si (a-Si)/ SiO(2) and Si/ SiO(2) /polycrystalline Si (poly-Si)/ 
      SiO(2) were used to measure the collapse force and to investigate their collapse 
      behavior by an atomic force microscope (AFM). The Si/SiON/a-Si/ SiO(2) MNL showed 
      a larger length of fragment in the collapse patterns at a smaller collapse force. 
      The Si/ SiO(2) /poly-Si/ SiO(2) MNL, however, demonstrated a smaller length of 
      fragment at a higher applied collapse force. The collapse forces increased by the 
      square of the linewidth in both Si/SiON/a-Si/ SiO(2) and Si/SiO(2) /poly-Si/ 
      SiO(2) MNLs. Once an AFM tip touches an Si/SiON/a-Si/ SiO(2) line, which is a 
      softer MNL, it was delaminated first at the Si/SiON interface. One end of the 
      delaminated line was first broken and then the other end was bent until it was 
      broken. A harder MNL, Si/ SiO(2) /poly-Si/ SiO(2), however, was broken at two 
      ends simultaneously after the delamination occurred at the Si/ SiO(2) /poly-Si 
      interface. The different collapse behaviors were attributed to the magnitude of 
      adhesion forces at the stack material interfaces and the mechanical strength of 
      MNLs.
FAU - Kim, Tae-Gon
AU  - Kim TG
AD  - Department of Materials Engineering, Hanyang University, Ansan 426-791, Republic 
      of Korea.
FAU - Wostyn, Kurt
AU  - Wostyn K
FAU - Mertens, Paul W
AU  - Mertens PW
FAU - Busnaina, Ahmed A
AU  - Busnaina AA
FAU - Park, Jin-Goo
AU  - Park JG
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
DEP - 20091130
PL  - England
TA  - Nanotechnology
JT  - Nanotechnology
JID - 101241272
EDAT- 2009/12/01 06:00
MHDA- 2009/12/01 06:01
CRDT- 2009/12/01 06:00
PHST- 2009/12/01 06:00 [entrez]
PHST- 2009/12/01 06:00 [pubmed]
PHST- 2009/12/01 06:01 [medline]
AID - S0957-4484(10)20641-4 [pii]
AID - 10.1088/0957-4484/21/1/015708 [doi]
PST - ppublish
SO  - Nanotechnology. 2010 Jan 8;21(1):015708. doi: 10.1088/0957-4484/21/1/015708. Epub 
      2009 Nov 30.