PMID- 20029113
OWN - NLM
STAT- MEDLINE
DCOM- 20100310
LR  - 20211020
IS  - 1600-5775 (Electronic)
IS  - 0909-0495 (Print)
IS  - 0909-0495 (Linking)
VI  - 17
IP  - 1
DP  - 2010 Jan
TI  - Synchrotron-radiation-stimulated etching of polydimethylsiloxane using XeF(2) as 
      a reaction gas.
PG  - 69-74
LID - 10.1107/S0909049509045658 [doi]
AB  - The synchrotron radiation (SR) stimulated etching of silicon elastomer 
      polydimethylsiloxane (PDMS) using XeF(2) as an etching gas has been demonstrated. 
      An etching system with differential pumps and two parabolic focusing mirrors was 
      constructed to perform the etching. The PDMS was found to be effectively etched 
      by the SR irradiation under the XeF(2) gas flow, and the etching process was 
      area-selective and anisotropic. An extremely high etching rate of 40-50 microm 
      (10 min)(-1) was easily obtained at an XeF(2) gas pressure of 0.2-0.4 torr. This 
      suggests that SR etching using XeF(2) gas provides a new microfabrication 
      technology for thick PDMS membranes, which can open new applications such as the 
      formation of three-dimensional microfluidic circuits.
FAU - Chiang, Tsung Yi
AU  - Chiang TY
AD  - Institute for Molecular Science, Okazaki 444-8585, Japan.
FAU - Makimura, Tetsuya
AU  - Makimura T
FAU - He, Tingchao
AU  - He T
FAU - Torii, Shuichi
AU  - Torii S
FAU - Yoshida, Tomoko
AU  - Yoshida T
FAU - Tero, Ryugo
AU  - Tero R
FAU - Wang, Changshun
AU  - Wang C
FAU - Urisu, Tsuneo
AU  - Urisu T
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
DEP - 20091126
PL  - United States
TA  - J Synchrotron Radiat
JT  - Journal of synchrotron radiation
JID - 9888878
RN  - 0 (Gases)
RN  - 3H3U766W84 (Xenon)
RN  - 6POJ14981P (xenon fluoride)
RN  - Q80VPU408O (Fluorides)
SB  - IM
MH  - Fluorides/*chemistry/radiation effects
MH  - Gases/chemistry/radiation effects
MH  - Materials Testing
MH  - Nanostructures/*chemistry/radiation effects/*ultrastructure
MH  - Nanotechnology/*methods
MH  - Surface Properties
MH  - *Synchrotrons
MH  - X-Rays
MH  - Xenon/*chemistry/radiation effects
PMC - PMC2797304
EDAT- 2009/12/24 06:00
MHDA- 2010/03/11 06:00
PMCR- 2009/11/26
CRDT- 2009/12/24 06:00
PHST- 2009/01/05 00:00 [received]
PHST- 2009/10/30 00:00 [accepted]
PHST- 2009/12/24 06:00 [entrez]
PHST- 2009/12/24 06:00 [pubmed]
PHST- 2010/03/11 06:00 [medline]
PHST- 2009/11/26 00:00 [pmc-release]
AID - S0909049509045658 [pii]
AID - ot5596 [pii]
AID - 10.1107/S0909049509045658 [doi]
PST - ppublish
SO  - J Synchrotron Radiat. 2010 Jan;17(1):69-74. doi: 10.1107/S0909049509045658. Epub 
      2009 Nov 26.