PMID- 20940893
OWN - NLM
STAT- MEDLINE
DCOM- 20110222
LR  - 20181023
IS  - 1094-4087 (Electronic)
IS  - 1094-4087 (Linking)
VI  - 18
IP  - 19
DP  - 2010 Sep 13
TI  - Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme 
      ultraviolet light.
PG  - 20019-28
LID - 10.1364/OE.18.020019 [doi]
AB  - We present the results of an optical and chemical, depth and surface study of 
      Al/Mo/SiC periodic multilayers, designed as high reflectivity coatings for the 
      extreme ultra-violet (EUV) range. In comparison to the previously studied Al/SiC 
      system, the introduction of Mo as a third material in the multilayer structure 
      allows us to decrease In comparison to the previously studied Al/SiC system with 
      a reflectance of 37% at near normal incidence around 17 nm, the introduction of 
      Mo as a third material in the multilayer structure allows us to decrease the 
      interfacial roughness and achieve an EUV reflectivity of 53.4%, measured with 
      synchrotron radiation. This is the first report of a reflectivity higher than 50% 
      around 17 nm. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) and x-ray 
      photoelectron spectroscopy (XPS) measurements are performed on the Al/Mo/SiC 
      system in order to analyze the individual layers within the stack. ToF-SIMS and 
      XPS results give evidence that the first SiC layer is partially oxidized, but the 
      O atoms do not reach the first Mo and Al layers. We use these results to properly 
      describe the multilayer stack and discuss the possible reasons for the difference 
      between the measured and simulated EUV reflectivity values.
FAU - Hu, Min-Hui
AU  - Hu MH
AD  - Laboratoire Chimie Physique-Matiere Rayonnement, UPMC Universite Paris 06, CNRS 
      UMR 7614, Paris, France.
FAU - Le Guen, Karine
AU  - Le Guen K
FAU - Andre, Jean-Michel
AU  - Andre JM
FAU - Jonnard, Philippe
AU  - Jonnard P
FAU - Meltchakov, Evgueni
AU  - Meltchakov E
FAU - Delmotte, Franck
AU  - Delmotte F
FAU - Galtayries, Anouk
AU  - Galtayries A
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
PL  - United States
TA  - Opt Express
JT  - Optics express
JID - 101137103
RN  - 0 (Carbon Compounds, Inorganic)
RN  - 0 (Membranes, Artificial)
RN  - 0 (Silicon Compounds)
RN  - 81AH48963U (Molybdenum)
RN  - CPD4NFA903 (Aluminum)
RN  - WXQ6E537EW (silicon carbide)
SB  - IM
MH  - Aluminum/*chemistry
MH  - Carbon Compounds, Inorganic/*chemistry
MH  - Equipment Design
MH  - Equipment Failure Analysis
MH  - *Lenses
MH  - Materials Testing
MH  - *Membranes, Artificial
MH  - Molybdenum/*chemistry
MH  - Photometry/*instrumentation
MH  - Refractometry/*instrumentation
MH  - Silicon Compounds/*chemistry
MH  - Ultraviolet Rays
EDAT- 2010/10/14 06:00
MHDA- 2011/02/23 06:00
CRDT- 2010/10/14 06:00
PHST- 2010/10/14 06:00 [entrez]
PHST- 2010/10/14 06:00 [pubmed]
PHST- 2011/02/23 06:00 [medline]
AID - 205531 [pii]
AID - 10.1364/OE.18.020019 [doi]
PST - ppublish
SO  - Opt Express. 2010 Sep 13;18(19):20019-28. doi: 10.1364/OE.18.020019.