PMID- 21047101
OWN - NLM
STAT- MEDLINE
DCOM- 20110322
LR  - 20101223
IS  - 1944-8244 (Print)
IS  - 1944-8244 (Linking)
VI  - 2
IP  - 12
DP  - 2010 Dec
TI  - Atomic layer deposition on phase-shift lithography generated photoresist patterns 
      for 1D nanochannel fabrication.
PG  - 3473-8
LID - 10.1021/am100592f [doi]
AB  - A versatile, low-cost, and flexible approach is presented for the fabrication of 
      millimeter-long, sub-100 nm wide 1D nanochannels with tunable wall properties 
      (wall thickness and material) over wafer-scale areas on glass, alumina, and 
      silicon surfaces. This approach includes three fabrication steps. First, sub-100 
      nm photoresist line patterns were generated by near-field contact phase-shift 
      lithography (NFC-PSL) using an inexpensive homemade borosilicate mask (NFC-PSM). 
      Second, various metal oxides were directly coated on the resist patterns with 
      low-temperature atomic layer deposition (ALD). Finally, the remaining photoresist 
      was removed via an acetone dip, and then planar nanochannel arrays were formed on 
      the substrate. In contrast to all the previous fabrication routes, the sub-100 nm 
      photoresist line patterns produced by NFC-PSL are directly employed as a 
      sacrificial layer for the creation of nanochannels. Because both the NFC-PSL and 
      the ALD deposition are highly reproducible processes, the strategy proposed here 
      can be regarded as a general route for nanochannel fabrication in a simplified 
      and reliable manner. In addition, the fabricated nanochannels were used as 
      templates to synthesize various organic and inorganic 1D nanostructures on the 
      substrate surface.
FAU - Guder, Firat
AU  - Guder F
AD  - Nanotechnology Group, Institute of Microsystems Engineering (IMTEK), 
      Albert-Ludwigs-University Freiburg, Georges-Kohler-Allee 103, 79110 Freiburg, 
      Germany. gueder@imtek.de
FAU - Yang, Yang
AU  - Yang Y
FAU - Kruger, Michael
AU  - Kruger M
FAU - Stevens, Gregory B
AU  - Stevens GB
FAU - Zacharias, Margit
AU  - Zacharias M
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
DEP - 20101103
PL  - United States
TA  - ACS Appl Mater Interfaces
JT  - ACS applied materials & interfaces
JID - 101504991
RN  - 0 (Macromolecular Substances)
SB  - IM
MH  - Crystallization/*methods
MH  - Macromolecular Substances/chemistry
MH  - Materials Testing
MH  - Molecular Conformation
MH  - Nanostructures/*chemistry/*ultrastructure
MH  - Nanotechnology/*methods
MH  - Particle Size
MH  - Photography/methods
MH  - Surface Properties
EDAT- 2010/11/05 06:00
MHDA- 2011/03/23 06:00
CRDT- 2010/11/05 06:00
PHST- 2010/11/05 06:00 [entrez]
PHST- 2010/11/05 06:00 [pubmed]
PHST- 2011/03/23 06:00 [medline]
AID - 10.1021/am100592f [doi]
PST - ppublish
SO  - ACS Appl Mater Interfaces. 2010 Dec;2(12):3473-8. doi: 10.1021/am100592f. Epub 
      2010 Nov 3.