PMID- 22323275
OWN - NLM
STAT- MEDLINE
DCOM- 20120629
LR  - 20200930
IS  - 1521-4095 (Electronic)
IS  - 0935-9648 (Linking)
VI  - 24
IP  - 10
DP  - 2012 Mar 8
TI  - Ultrafast polymerization inhibition by stimulated emission depletion for 
      three-dimensional nanolithography.
PG  - OP65-9
LID - 10.1002/adma.201103758 [doi]
AB  - To identify the depletion mechanism in the stimulated-emission-depletion (STED) 
      inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol 
      tetraacrylate, we perform lithography with pulsed excitation and tunable delayed 
      depletion. A fast component can unambiguously be assigned to stimulated emission. 
      Our results allow the systematical optimization of the conditions in 
      next-generation STED direct-laser-writing optical lithography.
CI  - Copyright (c) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
FAU - Fischer, Joachim
AU  - Fischer J
AD  - Karlsruhe Institute of Technology, Wolfgang-Gaede-Strasse 1, Karlsruhe, Germany. 
      joachim.fischer@kit.edu
FAU - Wegener, Martin
AU  - Wegener M
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
DEP - 20120210
PL  - Germany
TA  - Adv Mater
JT  - Advanced materials (Deerfield Beach, Fla.)
JID - 9885358
SB  - IM
MH  - Kinetics
MH  - Nanotechnology/*methods
MH  - Optical Phenomena
MH  - *Polymerization
MH  - Printing/*methods
EDAT- 2012/02/11 06:00
MHDA- 2012/06/30 06:00
CRDT- 2012/02/11 06:00
PHST- 2011/09/30 00:00 [received]
PHST- 2011/12/14 00:00 [revised]
PHST- 2012/02/11 06:00 [entrez]
PHST- 2012/02/11 06:00 [pubmed]
PHST- 2012/06/30 06:00 [medline]
AID - 10.1002/adma.201103758 [doi]
PST - ppublish
SO  - Adv Mater. 2012 Mar 8;24(10):OP65-9. doi: 10.1002/adma.201103758. Epub 2012 Feb 
      10.