PMID- 23128783 OWN - NLM STAT- PubMed-not-MEDLINE DCOM- 20130506 LR - 20121113 IS - 1361-6528 (Electronic) IS - 0957-4484 (Linking) VI - 23 IP - 48 DP - 2012 Dec 7 TI - Investigation of threshold voltage instability induced by gate bias stress in ZnO nanowire field effect transistors. PG - 485201 LID - 10.1088/0957-4484/23/48/485201 [doi] AB - We investigated the threshold voltage instability induced by gate bias (V(G)) stress in ZnO nanowire (NW) field effect transistors (FETs). By increasing the V(G) sweep ranges and repeatedly measuring the electrical characteristics of the ZnO NW FETs, the V(G) stress was produced in the dielectric layer underneath the ZnO NW. Consequently, the electrical conductance of the ZnO NW FETs decreased, and the threshold voltage shifted towards the positive V(G) direction. This threshold voltage instability induced by the V(G) stress is associated with the trapping of charges in the interface trap sites located in the ZnO NW-dielectric interface. Our study will be helpful for understanding the stability of ZnO NW FETs during repetitive operations. FAU - Choe, Minhyeok AU - Choe M AD - School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Korea. FAU - Park, Woojin AU - Park W FAU - Kang, Jang-Won AU - Kang JW FAU - Jeong, Sehee AU - Jeong S FAU - Hong, Woong-Ki AU - Hong WK FAU - Lee, Byoung Hun AU - Lee BH FAU - Park, Seong-Ju AU - Park SJ FAU - Lee, Takhee AU - Lee T LA - eng PT - Journal Article PT - Research Support, Non-U.S. Gov't DEP - 20121106 PL - England TA - Nanotechnology JT - Nanotechnology JID - 101241272 EDAT- 2012/11/07 06:00 MHDA- 2012/11/07 06:01 CRDT- 2012/11/07 06:00 PHST- 2012/11/07 06:00 [entrez] PHST- 2012/11/07 06:00 [pubmed] PHST- 2012/11/07 06:01 [medline] AID - 10.1088/0957-4484/23/48/485201 [doi] PST - ppublish SO - Nanotechnology. 2012 Dec 7;23(48):485201. doi: 10.1088/0957-4484/23/48/485201. Epub 2012 Nov 6.