PMID- 23969942 OWN - NLM STAT- PubMed-not-MEDLINE DCOM- 20140421 LR - 20130916 IS - 2040-3372 (Electronic) IS - 2040-3364 (Linking) VI - 5 IP - 19 DP - 2013 Oct 7 TI - A facile route to Si nanowire gate-all-around field effect transistors with a steep subthreshold slope. PG - 8968-72 LID - 10.1039/c3nr02552g [doi] AB - We present a facile CMOS-compatible fabrication of lateral gate-all-around (GAA) field effect transistors (FETs) based on concentric Si-SiO(2)/N(++)Si core-multi-shell nanowires (NWs). Si-SiO(2)/N(++)Si core-multi-shell NWs were prepared by sequential Si NW growth, thermal oxidation and Si deposition processes in a single chamber. The GAA NW FET was then fabricated using the Si core, SiO(2) inner-shell, N(++) Si outer-shell as a channel, gate dielectric, and gate electrode, respectively. A one-step wet etching process was able to define the gate and source-drain contact regions. The SiNW GAA FET clearly exhibits a geometry-dependent gating effect and a steep subthreshold slope due to the low interface trapped charge density at the interface of the Si core and the SiO(2) shell. Our proposed SiNW GAA structures offer new opportunities for low-energy-consumption digital device applications. FAU - Lee, Jae-Hyun AU - Lee JH AD - SKKU Advanced Institute of Nanotechnology, Sungkyunkwan University, Suwon, 440-746, Korea. dwhang@skku.edu. FAU - Kim, Byung-Sung AU - Kim BS FAU - Choi, Soon-Hyung AU - Choi SH FAU - Jang, Yamujin AU - Jang Y FAU - Hwang, Sung Woo AU - Hwang SW FAU - Whang, Dongmok AU - Whang D LA - eng PT - Journal Article PT - Research Support, Non-U.S. Gov't DEP - 20130822 PL - England TA - Nanoscale JT - Nanoscale JID - 101525249 EDAT- 2013/08/24 06:00 MHDA- 2013/08/24 06:01 CRDT- 2013/08/24 06:00 PHST- 2013/08/24 06:00 [entrez] PHST- 2013/08/24 06:00 [pubmed] PHST- 2013/08/24 06:01 [medline] AID - 10.1039/c3nr02552g [doi] PST - ppublish SO - Nanoscale. 2013 Oct 7;5(19):8968-72. doi: 10.1039/c3nr02552g. Epub 2013 Aug 22.