PMID- 24016184 OWN - NLM STAT- PubMed-not-MEDLINE DCOM- 20140530 LR - 20131022 IS - 1936-086X (Electronic) IS - 1936-0851 (Linking) VI - 7 IP - 10 DP - 2013 Oct 22 TI - Gate-controlled spin-orbit interaction in inas high-electron mobility transistor layers epitaxially transferred onto Si substrates. PG - 9106-14 LID - 10.1021/nn403715p [doi] AB - We demonstrate gate-controlled spin-orbit interaction (SOI) in InAs high-electron mobility transistor (HEMT) structures transferred epitaxially onto Si substrates. Successful epitaxial transfer of the multilayered structure after separation from an original substrate ensures that the InAs HEMT maintains a robust bonding interface and crystalline quality with a high electron mobility of 46200 cm(2)/(V s) at 77 K. Furthermore, Shubnikov-de Haas (SdH) oscillation analysis reveals that a Rashba SOI parameter (alpha) can be manipulated using a gate electric field for the purpose of spin field-effect transistor operation. An important finding is that the alpha value increases by about 30% in the InAs HEMT structure that has been transferred when compared to the as-grown structure. First-principles calculations indicate that the main causes of the large improvement in alpha are the bonding of the InAs HEMT active layers to a SiO2 insulating layer with a large band gap and the strain relaxation of the InAs channel layer during epitaxial transfer. The experimental results presented in this study offer a technological platform for the integration of III-V heterostructures onto Si substrates, permitting the spintronic devices to merge with standard Si circuitry and technology. FAU - Kim, Kyung-Ho AU - Kim KH AD - Spin Convergence Research Center, Korea Institute of Science and Technology (KIST), Seoul 136-791, Korea. FAU - Um, Doo-Seung AU - Um DS FAU - Lee, Hochan AU - Lee H FAU - Lim, Seongdong AU - Lim S FAU - Chang, Joonyeon AU - Chang J FAU - Koo, Hyun Cheol AU - Koo HC FAU - Oh, Min-Wook AU - Oh MW FAU - Ko, Hyunhyub AU - Ko H FAU - Kim, Hyung-Jun AU - Kim HJ LA - eng PT - Journal Article DEP - 20130923 PL - United States TA - ACS Nano JT - ACS nano JID - 101313589 EDAT- 2013/09/11 06:00 MHDA- 2013/09/11 06:01 CRDT- 2013/09/11 06:00 PHST- 2013/09/11 06:00 [entrez] PHST- 2013/09/11 06:00 [pubmed] PHST- 2013/09/11 06:01 [medline] AID - 10.1021/nn403715p [doi] PST - ppublish SO - ACS Nano. 2013 Oct 22;7(10):9106-14. doi: 10.1021/nn403715p. Epub 2013 Sep 23.