PMID- 24104490
OWN - NLM
STAT- PubMed-not-MEDLINE
DCOM- 20140605
LR  - 20181023
IS  - 1094-4087 (Electronic)
IS  - 1094-4087 (Linking)
VI  - 21 Suppl 4
DP  - 2013 Jul 1
TI  - Fabrication of resonant patterns using thermal nano-imprint lithography for 
      thin-film photovoltaic applications.
PG  - A631-41
LID - 10.1364/OE.21.00A631 [doi]
AB  - A single-step, low-cost fabrication method to generate resonant nano-grating 
      patterns on poly-methyl-methacrylate (PMMA; plexiglas) substrates using thermal 
      nano-imprint lithography is reported. A guided-mode resonant structure is 
      obtained by subsequent deposition of thin films of transparent conductive oxide 
      and amorphous silicon on the imprinted area. Referenced to equivalent planar 
      structures, around 25% and 45% integrated optical absorbance enhancement is 
      observed over the 450-nm to 900-nm wavelength range in one- and two-dimensional 
      patterned samples, respectively. The fabricated elements provided have 300-nm 
      periods. Thermally imprinted thermoplastic substrates hold potential for low-cost 
      fabrication of nano-patterned thin-film solar cells for efficient light 
      management.
FAU - Khaleque, Tanzina
AU  - Khaleque T
FAU - Svavarsson, Halldor Gudfinnur
AU  - Svavarsson HG
FAU - Magnusson, Robert
AU  - Magnusson R
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
PL  - United States
TA  - Opt Express
JT  - Optics express
JID - 101137103
EDAT- 2013/10/10 06:00
MHDA- 2013/10/10 06:01
CRDT- 2013/10/10 06:00
PHST- 2013/10/10 06:00 [entrez]
PHST- 2013/10/10 06:00 [pubmed]
PHST- 2013/10/10 06:01 [medline]
AID - 253798 [pii]
AID - 10.1364/OE.21.00A631 [doi]
PST - ppublish
SO  - Opt Express. 2013 Jul 1;21 Suppl 4:A631-41. doi: 10.1364/OE.21.00A631.