PMID- 24205685 OWN - NLM STAT- PubMed-not-MEDLINE DCOM- 20140108 LR - 20190715 IS - 1533-4880 (Print) IS - 1533-4880 (Linking) VI - 13 IP - 9 DP - 2013 Sep TI - Fabrication of nano-sized magnetic tunnel junctions using lift-off process assisted by atomic force probe tip. PG - 6467-70 AB - We present a fabrication method for nano-scale magnetic tunnel junctions (MTJs), employing e-beam lithography and lift-off process assisted by the probe tip of atomic force microscope (AFM). It is challenging to fabricate nano-sized MTJs on small substrates because it is difficult to use chemical mechanical planarization (CMP) process. The AFM-assisted lift-off process enables us to fabricate nano-sized MTJs on small substrates (12.5 mm x 12.5 mm) without CMP process. The e-beam patterning has been done using bi-layer resist, the poly methyl methacrylate (PMMA)/ hydrogen silsesquioxane (HSQ). The PMMA/HSQ resist patterns are used for both the etch mask for ion milling and the self-aligned mask for top contact formation after passivation. The self-aligned mask buried inside a passivation oxide layer, is readily lifted-off by the force exerted by the probe tip. The nano-MTJs (160 nm x 90 nm) fabricated by this method show clear current-induced magnetization switching with a reasonable TMR and critical switching current density. FAU - Jung, Ku Youl AU - Jung KY AD - Center for Spintronics Research, Korea Institute of Science and Technology, Seoul 136-791, Korea. FAU - Min, Byoung-Chul AU - Min BC FAU - Ahn, Chiyui AU - Ahn C FAU - Choi, Gyung-Min AU - Choi GM FAU - Shin, Il-Jae AU - Shin IJ FAU - Park, Seung-Young AU - Park SY FAU - Rhie, Kungwon AU - Rhie K FAU - Shin, Kyung-Ho AU - Shin KH LA - eng PT - Journal Article PL - United States TA - J Nanosci Nanotechnol JT - Journal of nanoscience and nanotechnology JID - 101088195 EDAT- 2013/11/12 06:00 MHDA- 2013/11/12 06:01 CRDT- 2013/11/12 06:00 PHST- 2013/11/12 06:00 [entrez] PHST- 2013/11/12 06:00 [pubmed] PHST- 2013/11/12 06:01 [medline] AID - 10.1166/jnn.2013.7616 [doi] PST - ppublish SO - J Nanosci Nanotechnol. 2013 Sep;13(9):6467-70. doi: 10.1166/jnn.2013.7616.