PMID- 24329003
OWN - NLM
STAT- PubMed-not-MEDLINE
DCOM- 20140825
LR  - 20211021
IS  - 1530-6992 (Electronic)
IS  - 1530-6984 (Print)
IS  - 1530-6984 (Linking)
VI  - 14
IP  - 1
DP  - 2014 Jan 8
TI  - Wafer-scale synthesis of monodisperse synthetic magnetic multilayer nanorods.
PG  - 333-8
LID - 10.1021/nl404089t [doi]
AB  - A double exposure technique has been used to fabricate nanoimprint stamps for 
      making monodisperse nanorods with controllable lengths. The nanorod length is 
      defined by a normal photolithography projection process whereas the nanorod width 
      is defined by an edge-lithography process using a soft polydimethylsiloxane 
      (PDMS) contact mask. Taking advantage of edge-lithography, the nanorod width can 
      be less than the diffraction limit of the exposure light. Using these nanorod 
      stamps, synthetic magnetic multilayer (SMM) nanorods have been fabricated using 
      nanoimprint lithography, resulting in a length variation of  approximately 3%. Nanorod magnetic 
      properties have been characterized in both longitudinal and in-plane transverse 
      directions of the nanorods. A theoretical model has been established to explain 
      the magnetic responses and has revealed that both shape anisotropy and interlayer 
      interactions are important in determining the properties of SMM nanorods.
FAU - Zhang, Mingliang
AU  - Zhang M
AD  - Department of Materials Science and Engineering, double daggerDepartment of Mechanical 
      Engineering, and  section signDepartment of Electrical Engineering, Stanford University , 
      Stanford, California 94305, United States.
FAU - Bechstein, Daniel J B
AU  - Bechstein DJ
FAU - Wilson, Robert J
AU  - Wilson RJ
FAU - Wang, Shan X
AU  - Wang SX
LA  - eng
GR  - U54 CA151459/CA/NCI NIH HHS/United States
GR  - R33 CA138330/CA/NCI NIH HHS/United States
GR  - U54CA151459/CA/NCI NIH HHS/United States
GR  - U54 CA119367/CA/NCI NIH HHS/United States
GR  - R33CA138330/CA/NCI NIH HHS/United States
PT  - Journal Article
PT  - Research Support, N.I.H., Extramural
PT  - Research Support, Non-U.S. Gov't
DEP - 20131217
PL  - United States
TA  - Nano Lett
JT  - Nano letters
JID - 101088070
PMC - PMC3931460
MID - NIHMS550514
EDAT- 2013/12/18 06:00
MHDA- 2013/12/18 06:01
PMCR- 2015/01/08
CRDT- 2013/12/17 06:00
PHST- 2013/12/17 06:00 [entrez]
PHST- 2013/12/18 06:00 [pubmed]
PHST- 2013/12/18 06:01 [medline]
PHST- 2015/01/08 00:00 [pmc-release]
AID - 10.1021/nl404089t [doi]
PST - ppublish
SO  - Nano Lett. 2014 Jan 8;14(1):333-8. doi: 10.1021/nl404089t. Epub 2013 Dec 17.