PMID- 25161836 OWN - NLM STAT- PubMed-not-MEDLINE DCOM- 20140827 LR - 20240329 IS - 2190-4286 (Print) IS - 2190-4286 (Electronic) IS - 2190-4286 (Linking) VI - 5 DP - 2014 TI - A nanometric cushion for enhancing scratch and wear resistance of hard films. PG - 1005-15 LID - 10.3762/bjnano.5.114 [doi] AB - Scratch resistance and friction are core properties which define the tribological characteristics of materials. Attempts to optimize these quantities at solid surfaces are the subject of intense technological interest. The capability to modulate these surface properties while preserving both the bulk properties of the materials and a well-defined, constant chemical composition of the surface is particularly attractive. We report herein the use of a soft, flexible underlayer to control the scratch resistance of oxide surfaces. Titania films of several nm thickness are coated onto substrates of silicon, kapton, polycarbonate, and polydimethylsiloxane (PDMS). The scratch resistance measured by scanning force microscopy is found to be substrate dependent, diminishing in the order PDMS, kapton/polycarbonate, Si/SiO2. Furthermore, when PDMS is applied as an intermediate layer between a harder substrate and titania, marked improvement in the scratch resistance is achieved. This is shown by quantitative wear tests for silicon or kapton, by coating these substrates with PDMS which is subsequently capped by a titania layer, resulting in enhanced scratch/wear resistance. The physical basis of this effect is explored by means of Finite Element Analysis, and we suggest a model for friction reduction based on the "cushioning effect" of a soft intermediate layer. FAU - Gotlib-Vainshtein, Katya AU - Gotlib-Vainshtein K AD - Department of Chemistry and Institute of Nanotechnology & Advanced Materials, Bar Ilan University, Ramat-Gan 52900, Israel. FAU - Girshevitz, Olga AU - Girshevitz O AD - Department of Chemistry and Institute of Nanotechnology & Advanced Materials, Bar Ilan University, Ramat-Gan 52900, Israel. FAU - Sukenik, Chaim N AU - Sukenik CN AD - Department of Chemistry and Institute of Nanotechnology & Advanced Materials, Bar Ilan University, Ramat-Gan 52900, Israel. FAU - Barlam, David AU - Barlam D AD - Department of Mechanical Engineering, Ben Gurion University, Beer Sheva, Israel. FAU - Cohen, Sidney R AU - Cohen SR AD - Department of Chemical Research Support, Weizmann Institute of Science, Rehovot 76100, Israel. LA - eng PT - Journal Article DEP - 20140710 PL - Germany TA - Beilstein J Nanotechnol JT - Beilstein journal of nanotechnology JID - 101551563 PMC - PMC4143114 OTO - NOTNLM OT - finite element analysis OT - hard coating OT - scanning probe microscopy OT - scratch OT - thin films OT - tribology EDAT- 2014/08/28 06:00 MHDA- 2014/08/28 06:01 PMCR- 2014/07/10 CRDT- 2014/08/28 06:00 PHST- 2014/04/02 00:00 [received] PHST- 2014/06/18 00:00 [accepted] PHST- 2014/08/28 06:00 [entrez] PHST- 2014/08/28 06:00 [pubmed] PHST- 2014/08/28 06:01 [medline] PHST- 2014/07/10 00:00 [pmc-release] AID - 10.3762/bjnano.5.114 [doi] PST - epublish SO - Beilstein J Nanotechnol. 2014 Jul 10;5:1005-15. doi: 10.3762/bjnano.5.114. eCollection 2014.