PMID- 26222209 OWN - NLM STAT- PubMed-not-MEDLINE DCOM- 20151222 LR - 20150826 IS - 1936-086X (Electronic) IS - 1936-0851 (Linking) VI - 9 IP - 8 DP - 2015 Aug 25 TI - Optoelectrical Molybdenum Disulfide (MoS2)--Ferroelectric Memories. PG - 8089-98 LID - 10.1021/acsnano.5b02078 [doi] AB - In this study, we fabricated and tested electronic and memory properties of field-effect transistors (FETs) based on monolayer or few-layer molybdenum disulfide (MoS2) on a lead zirconium titanate (Pb(Zr,Ti)O3, PZT) substrate that was used as a gate dielectric. MoS2-PZT FETs exhibit a large hysteresis of electronic transport with high ON/OFF ratios. We demonstrate that the interplay of polarization and interfacial phenomena strongly affects the electronic behavior and memory characteristics of MoS2-PZT FETs. We further demonstrate that MoS2-PZT memories have a number of advantages and unique features compared to their graphene-based counterparts as well as commercial ferroelectric random-access memories (FeRAMs), such as nondestructive data readout, low operation voltage, wide memory window and the possibility to write and erase them both electrically and optically. This dual optoelectrical operation of these memories can simplify the device architecture and offer additional practical functionalities, such as an instant optical erase of large data arrays that is unavailable for many conventional memories. FAU - Lipatov, Alexey AU - Lipatov A AD - Department of Chemistry, double daggerDepartment of Physics and Astronomy, and section signNebraska Center for Materials and Nanoscience, University of Nebraska , Lincoln, Nebraska 68588, United States. FAU - Sharma, Pankaj AU - Sharma P AD - Department of Chemistry, double daggerDepartment of Physics and Astronomy, and section signNebraska Center for Materials and Nanoscience, University of Nebraska , Lincoln, Nebraska 68588, United States. FAU - Gruverman, Alexei AU - Gruverman A AD - Department of Chemistry, double daggerDepartment of Physics and Astronomy, and section signNebraska Center for Materials and Nanoscience, University of Nebraska , Lincoln, Nebraska 68588, United States. FAU - Sinitskii, Alexander AU - Sinitskii A AD - Department of Chemistry, double daggerDepartment of Physics and Astronomy, and section signNebraska Center for Materials and Nanoscience, University of Nebraska , Lincoln, Nebraska 68588, United States. LA - eng PT - Journal Article PT - Research Support, Non-U.S. Gov't PT - Research Support, U.S. Gov't, Non-P.H.S. DEP - 20150729 PL - United States TA - ACS Nano JT - ACS nano JID - 101313589 OTO - NOTNLM OT - ferroelectric memory OT - field-effect transistor OT - hysteresis OT - lead zirconium titanate OT - molybdenum disulfide EDAT- 2015/07/30 06:00 MHDA- 2015/07/30 06:01 CRDT- 2015/07/30 06:00 PHST- 2015/07/30 06:00 [entrez] PHST- 2015/07/30 06:00 [pubmed] PHST- 2015/07/30 06:01 [medline] AID - 10.1021/acsnano.5b02078 [doi] PST - ppublish SO - ACS Nano. 2015 Aug 25;9(8):8089-98. doi: 10.1021/acsnano.5b02078. Epub 2015 Jul 29.