PMID- 26388365
OWN - NLM
STAT- MEDLINE
DCOM- 20160624
LR  - 20191210
IS  - 1873-4324 (Electronic)
IS  - 0003-2670 (Linking)
VI  - 891
DP  - 2015 Sep 3
TI  - Direct analysis of ultra-trace semiconductor gas by inductively coupled plasma 
      mass spectrometry coupled with gas to particle conversion-gas exchange technique.
PG  - 73-8
LID - S0003-2670(15)00849-1 [pii]
LID - 10.1016/j.aca.2015.06.048 [doi]
AB  - An inductively coupled plasma mass spectrometry (ICPMS) coupled with gas to 
      particle conversion-gas exchange technique was applied to the direct analysis of 
      ultra-trace semiconductor gas in ambient air. The ultra-trace semiconductor gases 
      such as arsine (AsH3) and phosphine (PH3) were converted to particles by reaction 
      with ozone (O3) and ammonia (NH3) gases within a gas to particle conversion 
      device (GPD). The converted particles were directly introduced and measured by 
      ICPMS through a gas exchange device (GED), which could penetrate the particles as 
      well as exchange to Ar from either non-reacted gases such as an air or remaining 
      gases of O3 and NH3. The particle size distribution of converted particles was 
      measured by scanning mobility particle sizer (SMPS) and the results supported the 
      elucidation of particle agglomeration between the particle converted from 
      semiconductor gas and the particle of ammonium nitrate (NH4NO3) which was 
      produced as major particle in GPD. Stable time-resolved signals from AsH3 and PH3 
      in air were obtained by GPD-GED-ICPMS with continuous gas introduction; however, 
      the slightly larger fluctuation, which could be due to the ionization fluctuation 
      of particles in ICP, was observed compared to that of metal carbonyl gas in Ar 
      introduced directly into ICPMS. The linear regression lines were obtained and the 
      limits of detection (LODs) of 1.5 pL L(-1) and 2.4 nL L(-1) for AsH3 and PH3, 
      respectively, were estimated. Since these LODs revealed sufficiently lower values 
      than the measurement concentrations required from semiconductor industry such as 
      0.5 nL L(-1) and 30 nL L(-1) for AsH3 and PH3, respectively, the GPD-GED-ICPMS 
      could be useful for direct and high sensitive analysis of ultra-trace 
      semiconductor gas in air.
CI  - Copyright (c) 2015 Elsevier B.V. All rights reserved.
FAU - Ohata, Masaki
AU  - Ohata M
AD  - Inorganic Standards Group, Research Institute for Material and Chemical 
      Measurement, National Metrology Institute of Japan (NMIJ), National Institute of 
      Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba 
      305-8563, Japan. Electronic address: m-oohata@aist.go.jp.
FAU - Sakurai, Hiromu
AU  - Sakurai H
AD  - Inorganic Standards Group, Research Institute for Material and Chemical 
      Measurement, National Metrology Institute of Japan (NMIJ), National Institute of 
      Advanced Industrial Science and Technology (AIST), 1-1-1, Umezono, Tsukuba 
      305-8563, Japan.
FAU - Nishiguchi, Kohei
AU  - Nishiguchi K
AD  - J-Science Lab Co. Ltd., 3-1 Hiuchigata, Kamitoba, Minami-ku, Kyoto 601-8144, 
      Japan.
FAU - Utani, Keisuke
AU  - Utani K
AD  - J-Science Lab Co. Ltd., 3-1 Hiuchigata, Kamitoba, Minami-ku, Kyoto 601-8144, 
      Japan.
FAU - Gunther, Detlef
AU  - Gunther D
AD  - ETH Zurich, Department of Chemistry and Applied Biosciences, Laboratory of 
      Inorganic Chemistry, Wolfgang-Pauli-Str. 10, 8093 Zurich, Switzerland.
LA  - eng
PT  - Evaluation Study
PT  - Journal Article
DEP - 20150807
PL  - Netherlands
TA  - Anal Chim Acta
JT  - Analytica chimica acta
JID - 0370534
RN  - 0 (Air Pollutants, Occupational)
RN  - 0 (Arsenicals)
RN  - 0 (Gases)
RN  - 0 (Phosphines)
RN  - 66H7ZZK23N (Ozone)
RN  - 7664-41-7 (Ammonia)
RN  - FW6947296I (phosphine)
RN  - V1I29R0RJQ (arsine)
SB  - IM
MH  - Air Pollutants, Occupational/*analysis
MH  - Ammonia/chemistry
MH  - Arsenicals/*analysis
MH  - Gases/*analysis
MH  - Limit of Detection
MH  - Mass Spectrometry/*methods
MH  - Ozone/chemistry
MH  - Particle Size
MH  - Phosphines/*analysis
MH  - *Semiconductors
OTO - NOTNLM
OT  - Direct analysis
OT  - Gas exchange
OT  - Gas to particle conversion
OT  - Inductively coupled plasma mass spectrometry
OT  - Particle size distribution
OT  - Semiconductor gas
EDAT- 2015/09/22 06:00
MHDA- 2016/06/25 06:00
CRDT- 2015/09/22 06:00
PHST- 2015/03/13 00:00 [received]
PHST- 2015/06/12 00:00 [revised]
PHST- 2015/06/18 00:00 [accepted]
PHST- 2015/09/22 06:00 [entrez]
PHST- 2015/09/22 06:00 [pubmed]
PHST- 2016/06/25 06:00 [medline]
AID - S0003-2670(15)00849-1 [pii]
AID - 10.1016/j.aca.2015.06.048 [doi]
PST - ppublish
SO  - Anal Chim Acta. 2015 Sep 3;891:73-8. doi: 10.1016/j.aca.2015.06.048. Epub 2015 
      Aug 7.