PMID- 26505031 OWN - NLM STAT- PubMed-not-MEDLINE DCOM- 20151124 LR - 20190715 IS - 1533-4899 (Electronic) IS - 1533-4880 (Linking) VI - 15 IP - 5 DP - 2015 May TI - Fabrication and Characterization of Field Effect Transistor Based on High-Aspect Ratio Sulfur-Doped ZnO Nanowires. PG - 3956-61 AB - Well-crystalline sulfur (S) doped ZnO nanowires have been grown via a simple thermal evaporation process on Si substrate using high purity zinc and sulfur powders in presence of oxygen. The as-grown S:ZnO nanowires were characterized in terms of their morphological structural, compositional and optical properties using several techniques such as FESEM, TEM, XRD, EDS and PL. The morphological characterizations revealed that the as-grown nanowires had diameters in the range of 60-100 nm with lengths 5-15 mum. The details structural properties confirmed the well-crystallinity and wurtzite hexagonal phase for the prepared nanowires. Room temperature photoluminescence (PL) spectrum showed a strong green band with a suppressed UV emission. The electrical properties of single S:ZnO nanowire was examined by fabricating single nanowire based field effect transistors (FETs). The detailed electrical transport results showed that S:ZnO nanowires possess n-type semiconducting behavior and exhibited an electron mobility of -67.7 cm2 V(-1) s(-1) and a carrier concentration of 2 x 10(17) cm(-3), respectively. FAU - Kim, Sang Hoon AU - Kim SH FAU - Umar, Ahmad AU - Umar A FAU - Al-Hajry, A AU - Al-Hajry A FAU - Dar, G N AU - Dar GN FAU - Abaker, M AU - Abaker M FAU - Hwang, S W AU - Hwang SW LA - eng PT - Journal Article PT - Research Support, Non-U.S. Gov't PL - United States TA - J Nanosci Nanotechnol JT - Journal of nanoscience and nanotechnology JID - 101088195 EDAT- 2015/10/28 06:00 MHDA- 2015/10/28 06:01 CRDT- 2015/10/28 06:00 PHST- 2015/10/28 06:00 [entrez] PHST- 2015/10/28 06:00 [pubmed] PHST- 2015/10/28 06:01 [medline] AID - 10.1166/jnn.2015.9530 [doi] PST - ppublish SO - J Nanosci Nanotechnol. 2015 May;15(5):3956-61. doi: 10.1166/jnn.2015.9530.