PMID- 26716220
OWN - NLM
STAT- PubMed-not-MEDLINE
DCOM- 20160122
LR  - 20190715
IS  - 1533-4899 (Electronic)
IS  - 1533-4880 (Linking)
VI  - 15
IP  - 9
DP  - 2015 Sep
TI  - Fabrication of Carbon Nanowire Arrays Using Inhomogeneous Dissolution-Diffusion 
      Kinetics and Photoresist Pyrolysis.
PG  - 6621-7
AB  - We report a simple and efficient method to fabricate carbon nanowire (CNW) arrays 
      with precise locations and spatial arrangements. This method is based on a 
      phenomenon in photoresist (PR) development that if the exposed posts are 
      close-spaced they are linked by some undissolved resist filaments. Pyrolysis made 
      the residual resist filaments to shrink and form CNWs under an inert atmosphere. 
      Scanning electron microscope (SEM) showed that these nanowires had orderly 
      arrangement and precise location. The formation of the CNWs was studied by 
      simulation and experiment, which indicated the nanowire was influenced by the 
      thickness of PR, the spacing distance between exposed posts, the diameter of 
      posts and the developing time. We also investigated the composition and 
      electrical properties of the resultant CNWs. The results showed that the CNW had 
      characteristics of p type semiconductor.
FAU - Gao, Kunpeng
AU  - Gao K
FAU - Zhu, Zhuanghui
AU  - Zhu Z
FAU - Yan, Jinyi
AU  - Yan J
FAU - Liao, Lingying
AU  - Liao L
FAU - Cheng, Ji
AU  - Cheng J
FAU - Li, Gang
AU  - Li G
FAU - Jin, Qinghui
AU  - Jin Q
FAU - Zhao, Jianlong
AU  - Zhao J
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
PL  - United States
TA  - J Nanosci Nanotechnol
JT  - Journal of nanoscience and nanotechnology
JID - 101088195
EDAT- 2015/12/31 06:00
MHDA- 2015/12/31 06:01
CRDT- 2015/12/31 06:00
PHST- 2015/12/31 06:00 [entrez]
PHST- 2015/12/31 06:00 [pubmed]
PHST- 2015/12/31 06:01 [medline]
AID - 10.1166/jnn.2015.10783 [doi]
PST - ppublish
SO  - J Nanosci Nanotechnol. 2015 Sep;15(9):6621-7. doi: 10.1166/jnn.2015.10783.