PMID- 26954771
OWN - NLM
STAT- PubMed-not-MEDLINE
DCOM- 20160810
LR  - 20160323
IS  - 1944-8252 (Electronic)
IS  - 1944-8244 (Linking)
VI  - 8
IP  - 11
DP  - 2016 Mar 23
TI  - Poly(cyclohexylethylene)-block-Poly(lactide) Oligomers for Ultrasmall 
      Nanopatterning Using Atomic Layer Deposition.
PG  - 7431-9
LID - 10.1021/acsami.5b12785 [doi]
AB  - Poly(cyclohexylethylene)-block-poly(lactide) (PCHE-PLA) block polymers were 
      synthesized through a combination of anionic polymerization, heterogeneous 
      catalytic hydrogenation and controlled ring-opening polymerization. Ordered thin 
      films of PCHE-PLA with ultrasmall hexagonally packed cylinders oriented 
      perpendicularly to the substrate surface were prepared by spin-coating and 
      subsequent solvent vapor annealing for use in two distinct templating strategies. 
      In one approach, selective hydrolytic degradation of the PLA domains generated 
      nanoporous PCHE templates with an average pore diameter of 5 +/- 1 nm corroborated 
      by atomic force microscopy and grazing incidence small-angle X-ray scattering. 
      Alternatively, sequential infiltration synthesis (SIS) was employed to deposit 
      Al2O3 selectively into the PLA domains of PCHE-PLA thin films. A combination of 
      argon ion milling and O2 reactive ion etching (RIE) enabled the replication of 
      the Al2O3 nanoarray from the PCHE-PLA template on diverse substrates including 
      silicon and gold with feature diameters less than 10 nm.
FAU - Yao, Li
AU  - Yao L
AD  - Department of Chemistry and double daggerDepartment of Chemical Engineering and Materials 
      Science, University of Minnesota , Minneapolis, Minnesota 55455-0431, United 
      States.
FAU - Oquendo, Luis E
AU  - Oquendo LE
AD  - Department of Chemistry and double daggerDepartment of Chemical Engineering and Materials 
      Science, University of Minnesota , Minneapolis, Minnesota 55455-0431, United 
      States.
FAU - Schulze, Morgan W
AU  - Schulze MW
AD  - Department of Chemistry and double daggerDepartment of Chemical Engineering and Materials 
      Science, University of Minnesota , Minneapolis, Minnesota 55455-0431, United 
      States.
FAU - Lewis, Ronald M 3rd
AU  - Lewis RM 3rd
AD  - Department of Chemistry and double daggerDepartment of Chemical Engineering and Materials 
      Science, University of Minnesota , Minneapolis, Minnesota 55455-0431, United 
      States.
FAU - Gladfelter, Wayne L
AU  - Gladfelter WL
AD  - Department of Chemistry and double daggerDepartment of Chemical Engineering and Materials 
      Science, University of Minnesota , Minneapolis, Minnesota 55455-0431, United 
      States.
FAU - Hillmyer, Marc A
AU  - Hillmyer MA
AD  - Department of Chemistry and double daggerDepartment of Chemical Engineering and Materials 
      Science, University of Minnesota , Minneapolis, Minnesota 55455-0431, United 
      States.
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
PT  - Research Support, U.S. Gov't, Non-P.H.S.
DEP - 20160308
PL  - United States
TA  - ACS Appl Mater Interfaces
JT  - ACS applied materials & interfaces
JID - 101504991
OTO - NOTNLM
OT  - atomic layer deposition
OT  - block polymer
OT  - nanolithography
OT  - nanopores
OT  - selective infiltration synthesis
OT  - self-assembly
OT  - solvent vapor annealing
EDAT- 2016/03/10 06:00
MHDA- 2016/03/10 06:01
CRDT- 2016/03/09 06:00
PHST- 2016/03/09 06:00 [entrez]
PHST- 2016/03/10 06:00 [pubmed]
PHST- 2016/03/10 06:01 [medline]
AID - 10.1021/acsami.5b12785 [doi]
PST - ppublish
SO  - ACS Appl Mater Interfaces. 2016 Mar 23;8(11):7431-9. doi: 10.1021/acsami.5b12785. 
      Epub 2016 Mar 8.