PMID- 27046164
OWN - NLM
STAT- PubMed-not-MEDLINE
DCOM- 20170425
LR  - 20170425
IS  - 1944-8252 (Electronic)
IS  - 1944-8244 (Linking)
VI  - 8
IP  - 16
DP  - 2016 Apr 27
TI  - Vacuum-Ultraviolet Promoted Oxidative Micro Photoetching of Graphene Oxide.
PG  - 10627-35
LID - 10.1021/acsami.6b00994 [doi]
AB  - Microprocessing of graphene oxide (GO) films is of fundamental importance in 
      fabricating graphene-based devices. We demonstrate the photoetching of GO sheets 
      using vacuum-ultraviolet (VUV, lambda = 172 nm) light under controlled atmospheric 
      pressure. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) 
      and differential interference contrast microscopy (DIC) studies revealed that the 
      photoetching of GO films successfully proceeded in the regions exposed to VUV 
      irradiation in the oxygen-containing atmosphere. Precise photoetching of the GO 
      sheets was achieved at a vacuum pressure of 5 x 10(3) Pa with VUV light 
      irradiation for 20 min. This was followed by VUV irradiation in a high vacuum 
      (<10(-3) Pa) and sonication in water. The photoetched GO sheets then transformed 
      into reduced GO (rGO) patterns. The minimum feature fabricated by this method was 
      2 mum wide lines aligned at an interval of 4 mum. This method provides a 
      cost-effective way to fabricate rGO patterns with fewer boundaries between rGO 
      sheets and offers a better integrity of rGO, which can be promising for further 
      applications in micro mechanics, micro electrochemistry, optoelectronics, etc.
FAU - Tu, Yudi
AU  - Tu Y
AD  - Department of Materials Science and Engineering, Graduate School of Engineering, 
      Kyoto University , Kyoto 606-8501, Japan.
FAU - Utsunomiya, Toru
AU  - Utsunomiya T
AD  - Department of Materials Science and Engineering, Graduate School of Engineering, 
      Kyoto University , Kyoto 606-8501, Japan.
FAU - Ichii, Takashi
AU  - Ichii T
AD  - Department of Materials Science and Engineering, Graduate School of Engineering, 
      Kyoto University , Kyoto 606-8501, Japan.
FAU - Sugimura, Hiroyuki
AU  - Sugimura H
AD  - Department of Materials Science and Engineering, Graduate School of Engineering, 
      Kyoto University , Kyoto 606-8501, Japan.
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
DEP - 20160413
PL  - United States
TA  - ACS Appl Mater Interfaces
JT  - ACS applied materials & interfaces
JID - 101504991
OTO - NOTNLM
OT  - differential interference contrast microscopy
OT  - graphene oxide
OT  - photochemistry
OT  - photoetching
OT  - vacuum-ultraviolet
EDAT- 2016/04/06 06:00
MHDA- 2016/04/06 06:01
CRDT- 2016/04/06 06:00
PHST- 2016/04/06 06:00 [entrez]
PHST- 2016/04/06 06:00 [pubmed]
PHST- 2016/04/06 06:01 [medline]
AID - 10.1021/acsami.6b00994 [doi]
PST - ppublish
SO  - ACS Appl Mater Interfaces. 2016 Apr 27;8(16):10627-35. doi: 
      10.1021/acsami.6b00994. Epub 2016 Apr 13.