PMID- 28617583
OWN - NLM
STAT- PubMed-not-MEDLINE
DCOM- 20190208
LR  - 20190215
IS  - 1520-6882 (Electronic)
IS  - 0003-2700 (Linking)
VI  - 89
IP  - 13
DP  - 2017 Jul 5
TI  - ToF-SIMS Depth Profiling of PS-b-PMMA Block Copolymers Using Ar(n)(+), C(60)(++), 
      and Cs(+) Sputtering Ions.
PG  - 6984-6991
LID - 10.1021/acs.analchem.7b00279 [doi]
AB  - Time-of-flight secondary ion mass spectrometry (ToF-SIMS) is a high performance 
      tool for molecular depth profiling of polymer films, in particular when they are 
      structured in microphases. However, a major issue is the degradation of polymer 
      materials under ion irradiation in reactions such as cross-linking, chain 
      breaking, or reorganization processes of polymers which have been demonstrated 
      for materials such as polystyrene (PS) and poly(methyl methacrylate) (PMMA). This 
      work aims at comparing ToF-SIMS molecular depth profiling of structured polymers 
      (polystyrene (PS)-b-polymethyl methacrylate (PMMA) block copolymers (BCP)) using 
      either ultralow energy cesium or the more recently introduced C(60)(++) (under NO 
      dosing and with sample cooling) and argon cluster ion beams (using Ar(1500)(+) 
      ions at 5 keV). The latter improved the quality of the depth profiles, especially 
      the argon cluster ion beam, as it is characterized by a greater homogeneity for 
      the sputter yields of PS and PMMA. No significant artifacts were observed, and 
      this was confirmed by the comparison of depth profiles obtained from films with 
      variable thickness, annealing time, and morphology (cylindrical blocks vs 
      spherical blocks). Comparison to a theoretical model (hexagonal centered pattern) 
      ensured that the ToF-SIMS depth profiles described the real morphology and may 
      thus be a relevant characterization tool to verify the morphology of the films as 
      a function of the deposition parameters.
FAU - Terlier, T
AU  - Terlier T
AUID- ORCID: 0000-0002-4092-0771
AD  - University Grenoble Alpes , F-38000 Grenoble, France.
AD  - CEA, LETI, MINATEC Campus, F-38054 Grenoble, France.
AD  - Univ Lyon, CNRS, Universite Claude Bernard Lyon 1, ENS Lyon, Institut des 
      Sciences Analytiques , UMR 5280, 5, rue de la Doua, F-69100 Villeurbanne, France.
FAU - Zappala, G
AU  - Zappala G
AD  - Dipartimento di Scienze Chimiche, Universita degli Studi di Catania and CSGI , 
      Viale A. Doria 6, 95125 Catania, Italy.
FAU - Marie, C
AU  - Marie C
AD  - University Grenoble Alpes , F-38000 Grenoble, France.
AD  - CEA, LETI, MINATEC Campus, F-38054 Grenoble, France.
FAU - Leonard, D
AU  - Leonard D
AD  - Univ Lyon, CNRS, Universite Claude Bernard Lyon 1, ENS Lyon, Institut des 
      Sciences Analytiques , UMR 5280, 5, rue de la Doua, F-69100 Villeurbanne, France.
FAU - Barnes, J-P
AU  - Barnes JP
AD  - University Grenoble Alpes , F-38000 Grenoble, France.
AD  - CEA, LETI, MINATEC Campus, F-38054 Grenoble, France.
FAU - Licciardello, A
AU  - Licciardello A
AD  - Dipartimento di Scienze Chimiche, Universita degli Studi di Catania and CSGI , 
      Viale A. Doria 6, 95125 Catania, Italy.
LA  - eng
PT  - Journal Article
PT  - Research Support, Non-U.S. Gov't
DEP - 20170615
PL  - United States
TA  - Anal Chem
JT  - Analytical chemistry
JID - 0370536
EDAT- 2017/06/16 06:00
MHDA- 2017/06/16 06:01
CRDT- 2017/06/16 06:00
PHST- 2017/06/16 06:00 [pubmed]
PHST- 2017/06/16 06:01 [medline]
PHST- 2017/06/16 06:00 [entrez]
AID - 10.1021/acs.analchem.7b00279 [doi]
PST - ppublish
SO  - Anal Chem. 2017 Jul 5;89(13):6984-6991. doi: 10.1021/acs.analchem.7b00279. Epub 
      2017 Jun 15.