PMID- 29610809
OWN - NLM
STAT- PubMed-not-MEDLINE
DCOM- 20180802
LR  - 20180802
IS  - 2040-3372 (Electronic)
IS  - 2040-3364 (Linking)
VI  - 10
IP  - 15
DP  - 2018 Apr 19
TI  - In-plane stress development in mesoporous thin films.
PG  - 7002-7015
LID - 10.1039/c8nr00793d [doi]
AB  - Ordered mesoporous thin films of TiO2 and CexZr1-xO2 (x = 0, 0.5, 1) were 
      prepared via an evaporation-induced self-assembly (EISA) process and subsequently 
      investigated in terms of the developing intrinsic and residual in-plane stress. 
      These mechanical properties were determined by the curvature method, which is 
      based on the determination of the deflection of light due to concave or convex 
      bending of the films on a substrate. The films were investigated with regard to 
      the intrinsic stress during heat treatment up to 500  degrees C and to the residual 
      stress at room temperature for several annealing temperatures. Following this 
      strategy, the influence of the decomposition of a block copolymer template on the 
      intrinsic stress as well as the pore collapsing on the residual stress was 
      analyzed. Nanoporous TiO2 thin films were prepared using two different block 
      copolymers (PIB50-b-PEO45 and Pluronic(R) F127). A comparison between the templated 
      and non-templated TiO2 films showed the lowest intrinsic and residual stress for 
      the ordered mesoporous material prepared with PIB50-b-PEO45 indicating that the 
      distributed polymer and the corresponding mesopores act as relaxing agents for 
      the system. This was verified by mesoporous CexZr1-xO2 (x = 0, 0.5, 1) thin films 
      showing a comparable behavior in terms of the experienced intrinsic stress. This 
      work reveals an increase in the residual in-plane stress during pore collapse, 
      which lays the foundation for further understanding of the stress-related 
      mechanical properties of mesoporous thin films.
FAU - Cop, P
AU  - Cop P
AD  - Physikalisch-Chemisches Institut, Justus-Liebig-Universitat, Heinrich-Buff-Ring 
      17, 35392 Giessen, Germany. smarsly@uni-giessen.de.
FAU - Kitano, S
AU  - Kitano S
FAU - Niinuma, K
AU  - Niinuma K
FAU - Smarsly, B M
AU  - Smarsly BM
FAU - Kozuka, H
AU  - Kozuka H
LA  - eng
PT  - Journal Article
PL  - England
TA  - Nanoscale
JT  - Nanoscale
JID - 101525249
EDAT- 2018/04/04 06:00
MHDA- 2018/04/04 06:01
CRDT- 2018/04/04 06:00
PHST- 2018/04/04 06:00 [pubmed]
PHST- 2018/04/04 06:01 [medline]
PHST- 2018/04/04 06:00 [entrez]
AID - 10.1039/c8nr00793d [doi]
PST - ppublish
SO  - Nanoscale. 2018 Apr 19;10(15):7002-7015. doi: 10.1039/c8nr00793d.