PMID- 30715041
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20201001
IS  - 2072-666X (Print)
IS  - 2072-666X (Electronic)
IS  - 2072-666X (Linking)
VI  - 9
IP  - 11
DP  - 2018 Oct 24
TI  - Characterization of CMP Slurries Using Densitometry and Refractive Index 
      Measurements.
LID - 10.3390/mi9110542 [doi]
LID - 542
AB  - We investigated the possibility of employing refractive index (RI) measurements 
      for inline incoming slurry control at the point of use (POU), as an alternative 
      to the widespread densitometry method. As such, it became necessary to determine 
      if RI could detect smaller changes in slurry composition and, therefore, provide 
      a tighter control. Three industrially-relevant silica-based slurries, namely, 
      Fujimi PL-7106, Klebosol 1501-50, and CMC W7801, were characterized using both 
      densitometry and RI measurements. Initial solutions of the three slurries were 
      prepared and increasingly small amounts of ultrapurified water (UPW) were added 
      to study the change in slurry properties. Results showed that both density and RI 
      decreased linearly with the addition of water for all three slurries, with the 
      1501-50 being the most sensitive to water addition. A linear correlation between 
      the two properties was found, with R(2) values that exceeded 0.95 in all cases. 
      Furthermore, the approximate limit of detection of both metrology tools was 
      estimated based on the slope of the fitting line and resolution. When compared to 
      densitometry, RI was found to be the far superior method for detecting smaller 
      changes in water concentration.
FAU - Vazquez Bengochea, Leticia
AU  - Vazquez Bengochea L
AUID- ORCID: 0000-0003-2374-4785
AD  - Department of Chemical and Environmental Engineering, University of Arizona, 
      Tucson, AZ 85721, USA. leticiavazben@email.arizona.edu.
FAU - Sampurno, Yasa
AU  - Sampurno Y
AD  - Department of Chemical and Environmental Engineering, University of Arizona, 
      Tucson, AZ 85721, USA. yasayap@email.arizona.edu.
AD  - Araca Inc., Tucson, AZ 85718, USA. yasayap@email.arizona.edu.
FAU - Kavaljer, Marcus
AU  - Kavaljer M
AD  - K-Patents Oy, 01510 Vantaa, Finland. marcus.kavaljer@kpatents.com.
FAU - Johnston, Rob
AU  - Johnston R
AD  - Yarbrough, a Watlow Company, Austin, TX 78758, USA. rjohnston@yswsemi.com.
FAU - Philipossian, Ara
AU  - Philipossian A
AD  - Department of Chemical and Environmental Engineering, University of Arizona, 
      Tucson, AZ 85721, USA. ara@email.arizona.edu.
AD  - Araca Inc., Tucson, AZ 85718, USA. ara@email.arizona.edu.
LA  - eng
PT  - Journal Article
DEP - 20181024
PL  - Switzerland
TA  - Micromachines (Basel)
JT  - Micromachines
JID - 101640903
PMC - PMC6266087
OTO - NOTNLM
OT  - chemical mechanical planarization
OT  - in-line monitoring and control
OT  - semiconductor technology
OT  - slurry characterization
COIS- The authors declare no conflicts of interest.
EDAT- 2019/02/05 06:00
MHDA- 2019/02/05 06:01
PMCR- 2018/10/24
CRDT- 2019/02/05 06:00
PHST- 2018/10/02 00:00 [received]
PHST- 2018/10/21 00:00 [revised]
PHST- 2018/10/22 00:00 [accepted]
PHST- 2019/02/05 06:00 [entrez]
PHST- 2019/02/05 06:00 [pubmed]
PHST- 2019/02/05 06:01 [medline]
PHST- 2018/10/24 00:00 [pmc-release]
AID - mi9110542 [pii]
AID - micromachines-09-00542 [pii]
AID - 10.3390/mi9110542 [doi]
PST - epublish
SO  - Micromachines (Basel). 2018 Oct 24;9(11):542. doi: 10.3390/mi9110542.