PMID- 31082251
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20191120
IS  - 1520-5827 (Electronic)
IS  - 0743-7463 (Linking)
VI  - 35
IP  - 21
DP  - 2019 May 28
TI  - Adsorptive Spin Coating To Study Thin-Film Stability in Both Wetting and 
      Nonwetting Regimes.
PG  - 6922-6928
LID - 10.1021/acs.langmuir.9b00923 [doi]
AB  - A new thin-film fabrication method, adsorptive spin coating, was evaluated in the 
      preparation of poly(vinyl alcohol) (PVOH) thin films on silicon-wafer-supported 
      poly(dimethylsiloxane) (PDMS) substrates. This method takes advantage of the 
      rapid spontaneous adsorption of PVOH at the substrate-solution interface during 
      the brief contact period and the directionality of drying during spinning. 
      Similar to the results obtained using dip coating, the PVOH thin films wet the 2 
      kDa PDMS substrate and exhibit dewetted fractal morphologies on thicker PDMS 
      substrates. This method generated PVOH films with thicknesses that were 
      comparable to those prepared by dip coating except that thicker PVOH films were 
      obtained at lower spin rates, following the Meyerhofer relationship in the 
      wetting regime. Stepwise dewetting dynamics of confined PVOH drops were captured 
      using high-speed photography. Drying and polymer aggregation initiate at the 
      periphery of the drop and propagate toward the center of the drop. Each dewetted 
      thin film adopts the footprint of the original drop and shows globally ordered 
      patterns, which depend on both initial drop size and spin rate. The PVOH thin 
      films have excellent stability toward water rinse if they are continuous and are 
      given sufficient time to dry. This new adsorptive spin-coating method is not only 
      straightforward but also unique in its ability to generate globally ordered 
      morphologies that are the outcome of fast spontaneous adsorption, spin symmetry, 
      and temporally and spatially adjustable drying rates. It is a valuable tool for 
      fabricating a wide range of thin-film systems where surface adsorption/reaction 
      is rapid, in both wetting and nonwetting regimes.
FAU - Qi, Yueyue
AU  - Qi Y
AD  - Chemistry Department , Mount Holyoke College , South Hadley , Massachusetts 01075 
      , United States.
FAU - Nguyen, Haimi
AU  - Nguyen H
AD  - Chemistry Department , Mount Holyoke College , South Hadley , Massachusetts 01075 
      , United States.
FAU - Lim, Kelly Sin Ee
AU  - Lim KSE
AD  - Chemistry Department , Mount Holyoke College , South Hadley , Massachusetts 01075 
      , United States.
FAU - Wang, Wenyun
AU  - Wang W
AD  - Chemistry Department , Mount Holyoke College , South Hadley , Massachusetts 01075 
      , United States.
FAU - Chen, Wei
AU  - Chen W
AUID- ORCID: 0000-0002-6970-3455
AD  - Chemistry Department , Mount Holyoke College , South Hadley , Massachusetts 01075 
      , United States.
LA  - eng
PT  - Journal Article
DEP - 20190513
PL  - United States
TA  - Langmuir
JT  - Langmuir : the ACS journal of surfaces and colloids
JID - 9882736
EDAT- 2019/05/15 06:00
MHDA- 2019/05/15 06:01
CRDT- 2019/05/15 06:00
PHST- 2019/05/15 06:00 [pubmed]
PHST- 2019/05/15 06:01 [medline]
PHST- 2019/05/15 06:00 [entrez]
AID - 10.1021/acs.langmuir.9b00923 [doi]
PST - ppublish
SO  - Langmuir. 2019 May 28;35(21):6922-6928. doi: 10.1021/acs.langmuir.9b00923. Epub 
      2019 May 13.