PMID- 32985173
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20201022
IS  - 1944-8252 (Electronic)
IS  - 1944-8244 (Linking)
VI  - 12
IP  - 42
DP  - 2020 Oct 21
TI  - Chemical Patterning of Graphene via Metal-Assisted Highly Energetic Electron 
      Irradiation for Graphene Homojunction-Based Gas Sensors.
PG  - 47802-47810
LID - 10.1021/acsami.0c12063 [doi]
AB  - To gain the target functionality of graphene for gas detection, nonfocused and 
      large-scale compatible MeV electron beam irradiation on graphene with Ag patterns 
      is innovatively adopted in air for chemical patterning of graphene. This strategy 
      allows the metal-assisted site-specific oxidation of graphene to realize 
      monolithically integrated graphene-chemically patterned graphene (CPG)-graphene 
      homojunction-based gas sensors. The size-tunable CPG patterns can be mediated by 
      regulating the size of Ag prepatterns. The impacts of highly energetic electron 
      irradiation (HEEI) on graphene are summarized as follows: (i) the selective 
      p-type doping and the defect generation of graphene by the HEEI-induced 
      oxidation, (ii) the resistance of the homojunction devices manipulated by the 
      HEEI dose, (iii) the band gap opening of graphene as well as the lowering of the 
      Fermi level, (iv) the work function values for pristine graphene and CPG 
      corresponding to 4.14 and 4.88 eV, respectively, and (v) graphene-CPG-graphene 
      homojunction for NO(2) gas, revealing an 839% enhanced gas response compared with 
      that of the pristine graphene-based gas sensor.
FAU - Bae, Garam
AU  - Bae G
AD  - Thin Film Materials Research Center, Korea Research Institute of Chemical 
      Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 34114, Republic of Korea.
AD  - Department of Physics, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon 
      16419, Republic of Korea.
FAU - Song, Da Som
AU  - Song DS
AD  - Thin Film Materials Research Center, Korea Research Institute of Chemical 
      Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 34114, Republic of Korea.
FAU - Lim, Yi Rang
AU  - Lim YR
AD  - Thin Film Materials Research Center, Korea Research Institute of Chemical 
      Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 34114, Republic of Korea.
FAU - Jeon, In Su
AU  - Jeon IS
AUID- ORCID: 0000-0003-3989-3718
AD  - Thin Film Materials Research Center, Korea Research Institute of Chemical 
      Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 34114, Republic of Korea.
FAU - Jang, Moonjeong
AU  - Jang M
AD  - Thin Film Materials Research Center, Korea Research Institute of Chemical 
      Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 34114, Republic of Korea.
FAU - Yoon, Yeoheung
AU  - Yoon Y
AD  - Thin Film Materials Research Center, Korea Research Institute of Chemical 
      Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 34114, Republic of Korea.
FAU - Jeon, Cheolho
AU  - Jeon C
AD  - Advanced Nano Surface Research Group, Korea Basic Science Institute, Daejeon 
      34133, Republic of Korea.
FAU - Song, Wooseok
AU  - Song W
AUID- ORCID: 0000-0002-0487-2055
AD  - Thin Film Materials Research Center, Korea Research Institute of Chemical 
      Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 34114, Republic of Korea.
FAU - Myung, Sung
AU  - Myung S
AUID- ORCID: 0000-0003-2030-2391
AD  - Thin Film Materials Research Center, Korea Research Institute of Chemical 
      Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 34114, Republic of Korea.
FAU - Lee, Sun Sook
AU  - Lee SS
AUID- ORCID: 0000-0002-3518-5952
AD  - Thin Film Materials Research Center, Korea Research Institute of Chemical 
      Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 34114, Republic of Korea.
FAU - Park, Chong-Yun
AU  - Park CY
AD  - Department of Physics, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon 
      16419, Republic of Korea.
FAU - An, Ki-Seok
AU  - An KS
AUID- ORCID: 0000-0001-8250-7347
AD  - Thin Film Materials Research Center, Korea Research Institute of Chemical 
      Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 34114, Republic of Korea.
LA  - eng
PT  - Journal Article
DEP - 20201008
PL  - United States
TA  - ACS Appl Mater Interfaces
JT  - ACS applied materials & interfaces
JID - 101504991
SB  - IM
OTO - NOTNLM
OT  - chemical patterning
OT  - gas sensor
OT  - graphene
OT  - highly energetic electron irradiation
OT  - selective area functionalization
EDAT- 2020/09/29 06:00
MHDA- 2020/09/29 06:01
CRDT- 2020/09/28 08:42
PHST- 2020/09/29 06:00 [pubmed]
PHST- 2020/09/29 06:01 [medline]
PHST- 2020/09/28 08:42 [entrez]
AID - 10.1021/acsami.0c12063 [doi]
PST - ppublish
SO  - ACS Appl Mater Interfaces. 2020 Oct 21;12(42):47802-47810. doi: 
      10.1021/acsami.0c12063. Epub 2020 Oct 8.