PMID- 33042763
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20231112
IS  - 2198-3844 (Print)
IS  - 2198-3844 (Electronic)
IS  - 2198-3844 (Linking)
VI  - 7
IP  - 19
DP  - 2020 Oct
TI  - Stamping Fabrication of Flexible Planar Micro-Supercapacitors Using Porous 
      Graphene Inks.
PG  - 2001561
LID - 10.1002/advs.202001561 [doi]
LID - 2001561
AB  - High performance, flexibility, safety, and robust integration for 
      micro-supercapacitors (MSCs) are of immense interest for the urgent demand for 
      miniaturized, smart energy-storage devices. However, repetitive photolithography 
      processes in the fabrication of on-chip electronic components including various 
      photoresists, masks, and toxic etchants are often not well-suited for industrial 
      production. Here, a cost-effective stamping strategy is developed for scalable 
      and rapid preparation of graphene-based planar MSCs. Combining stamps with 
      desired shapes and highly conductive graphene inks, flexible MSCs with controlled 
      structures are prepared on arbitrary substrates without any metal current 
      collectors, additives, and polymer binders. The interdigitated MSC exhibits high 
      areal capacitance up to 21.7 mF cm(-2) at a current of 0.5 mA and a high power 
      density of 6 mW cm(-2) at an energy density of 5 microWh cm(-2). Moreover, the MSCs 
      show outstanding cycling performance and remarkable flexibility over 10 000 
      charge-discharge cycles and 300 bending cycles. In addition, the capacitance and 
      output voltage of the MSCs are easily adjustable through interconnection with 
      well-defined arrangements. The efficient, rapid manufacturing of the 
      graphene-based interdigital MSCs with outstanding flexibility, shape diversity, 
      and high areal capacitance shows great potential in wearable and portable 
      electronics.
CI  - (c) 2020 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
FAU - Li, Fei
AU  - Li F
AD  - Material Systems for Nanoelectronics Chemnitz University of Technology Chemnitz 
      09107 Germany.
AD  - Center for Materials Architectures and Integration of Nanomembranes (MAIN) 
      Chemnitz University of Technology Chemnitz 09126 Germany.
AD  - Institute for Integrative Nanosciences Leibniz IFW Dresden Dresden 01069 Germany.
FAU - Qu, Jiang
AU  - Qu J
AD  - Material Systems for Nanoelectronics Chemnitz University of Technology Chemnitz 
      09107 Germany.
AD  - Center for Materials Architectures and Integration of Nanomembranes (MAIN) 
      Chemnitz University of Technology Chemnitz 09126 Germany.
AD  - Institute for Integrative Nanosciences Leibniz IFW Dresden Dresden 01069 Germany.
FAU - Li, Yang
AU  - Li Y
AD  - Material Systems for Nanoelectronics Chemnitz University of Technology Chemnitz 
      09107 Germany.
AD  - Center for Materials Architectures and Integration of Nanomembranes (MAIN) 
      Chemnitz University of Technology Chemnitz 09126 Germany.
AD  - Institute for Integrative Nanosciences Leibniz IFW Dresden Dresden 01069 Germany.
FAU - Wang, Jinhui
AU  - Wang J
AD  - Material Systems for Nanoelectronics Chemnitz University of Technology Chemnitz 
      09107 Germany.
AD  - Center for Materials Architectures and Integration of Nanomembranes (MAIN) 
      Chemnitz University of Technology Chemnitz 09126 Germany.
AD  - Institute for Integrative Nanosciences Leibniz IFW Dresden Dresden 01069 Germany.
FAU - Zhu, Minshen
AU  - Zhu M
AD  - Institute for Integrative Nanosciences Leibniz IFW Dresden Dresden 01069 Germany.
FAU - Liu, Lixiang
AU  - Liu L
AD  - Material Systems for Nanoelectronics Chemnitz University of Technology Chemnitz 
      09107 Germany.
AD  - Center for Materials Architectures and Integration of Nanomembranes (MAIN) 
      Chemnitz University of Technology Chemnitz 09126 Germany.
AD  - Institute for Integrative Nanosciences Leibniz IFW Dresden Dresden 01069 Germany.
FAU - Ge, Jin
AU  - Ge J
AD  - Institute for Integrative Nanosciences Leibniz IFW Dresden Dresden 01069 Germany.
FAU - Duan, Shengkai
AU  - Duan S
AD  - Material Systems for Nanoelectronics Chemnitz University of Technology Chemnitz 
      09107 Germany.
AD  - Center for Materials Architectures and Integration of Nanomembranes (MAIN) 
      Chemnitz University of Technology Chemnitz 09126 Germany.
AD  - Institute for Integrative Nanosciences Leibniz IFW Dresden Dresden 01069 Germany.
FAU - Li, Tianming
AU  - Li T
AD  - Material Systems for Nanoelectronics Chemnitz University of Technology Chemnitz 
      09107 Germany.
AD  - Center for Materials Architectures and Integration of Nanomembranes (MAIN) 
      Chemnitz University of Technology Chemnitz 09126 Germany.
AD  - Institute for Integrative Nanosciences Leibniz IFW Dresden Dresden 01069 Germany.
FAU - Bandari, Vineeth Kumar
AU  - Bandari VK
AD  - Material Systems for Nanoelectronics Chemnitz University of Technology Chemnitz 
      09107 Germany.
AD  - Center for Materials Architectures and Integration of Nanomembranes (MAIN) 
      Chemnitz University of Technology Chemnitz 09126 Germany.
AD  - Institute for Integrative Nanosciences Leibniz IFW Dresden Dresden 01069 Germany.
FAU - Huang, Ming
AU  - Huang M
AD  - School of Materials Science and Engineering Ulsan National Institute of Science 
      and Technology (UNIST) Ulsan 44919 Republic of Korea.
FAU - Zhu, Feng
AU  - Zhu F
AD  - Material Systems for Nanoelectronics Chemnitz University of Technology Chemnitz 
      09107 Germany.
AD  - Center for Materials Architectures and Integration of Nanomembranes (MAIN) 
      Chemnitz University of Technology Chemnitz 09126 Germany.
AD  - Institute for Integrative Nanosciences Leibniz IFW Dresden Dresden 01069 Germany.
AD  - State Key Laboratory of Polymer Physics and Chemistry Changchun Institute of 
      Applied Chemistry Chinese Academy of Sciences Changchun 130022 P. R. China.
FAU - Schmidt, Oliver G
AU  - Schmidt OG
AUID- ORCID: 0000-0001-9503-8367
AD  - Material Systems for Nanoelectronics Chemnitz University of Technology Chemnitz 
      09107 Germany.
AD  - Center for Materials Architectures and Integration of Nanomembranes (MAIN) 
      Chemnitz University of Technology Chemnitz 09126 Germany.
AD  - Institute for Integrative Nanosciences Leibniz IFW Dresden Dresden 01069 Germany.
AD  - School of Science Dresden University of Technology Dresden 01062 Germany.
LA  - eng
PT  - Journal Article
DEP - 20200727
PL  - Germany
TA  - Adv Sci (Weinh)
JT  - Advanced science (Weinheim, Baden-Wurttemberg, Germany)
JID - 101664569
PMC - PMC7539196
OTO - NOTNLM
OT  - areal energy density
OT  - graphene inks
OT  - micro-supercapacitors
OT  - stamping
COIS- The authors declare no conflict of interest.
EDAT- 2020/10/13 06:00
MHDA- 2020/10/13 06:01
PMCR- 2020/07/27
CRDT- 2020/10/12 05:31
PHST- 2020/04/29 00:00 [received]
PHST- 2020/05/28 00:00 [revised]
PHST- 2020/10/12 05:31 [entrez]
PHST- 2020/10/13 06:00 [pubmed]
PHST- 2020/10/13 06:01 [medline]
PHST- 2020/07/27 00:00 [pmc-release]
AID - ADVS1914 [pii]
AID - 10.1002/advs.202001561 [doi]
PST - epublish
SO  - Adv Sci (Weinh). 2020 Jul 27;7(19):2001561. doi: 10.1002/advs.202001561. 
      eCollection 2020 Oct.