PMID- 34852522
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20211202
IS  - 1089-7623 (Electronic)
IS  - 0034-6748 (Linking)
VI  - 92
IP  - 11
DP  - 2021 Nov 1
TI  - Extreme ultraviolet-excited time-resolved luminescence spectroscopy using an 
      ultrafast table-top high-harmonic generation source.
PG  - 113004
LID - 10.1063/5.0064780 [doi]
AB  - We present a table-top extreme ultraviolet (XUV) beamline for measuring time- and 
      frequency-resolved XUV-excited optical luminescence (XEOL) with additional 
      femtosecond-resolution XUV transient absorption spectroscopy functionality. XUV 
      pulses are generated via high-harmonic generation using a near-infrared pulse in 
      a noble gas medium and focused to excite luminescence from a solid sample. The 
      luminescence is collimated and guided into a streak camera where its spectral 
      components are temporally resolved with picosecond temporal resolution. We 
      time-resolve XUV-excited luminescence and compare the results to luminescence 
      decays excited at longer wavelengths for three different materials: (i) sodium 
      salicylate, an often used XUV scintillator; (ii) fluorescent labeling molecule 
      4-carbazole benzoic (CB) acid; and (iii) a zirconium metal oxo-cluster labeled 
      with CB, which is a photoresist candidate for extreme-ultraviolet lithography. 
      Our results establish time-resolved XEOL as a new technique to measure transient 
      XUV-driven phenomena in solid-state samples and identify decay mechanisms of 
      molecules following XUV and soft-x-ray excitation.
FAU - van der Geest, M L S
AU  - van der Geest MLS
AUID- ORCID: 0000000166471655
AD  - Advanced Research Center for Nanolithography, Science Park 106, 1098 XG 
      Amsterdam, The Netherlands.
FAU - Sadegh, N
AU  - Sadegh N
AUID- ORCID: 0000000232834697
AD  - Advanced Research Center for Nanolithography, Science Park 106, 1098 XG 
      Amsterdam, The Netherlands.
FAU - Meerwijk, T M
AU  - Meerwijk TM
AD  - Advanced Research Center for Nanolithography, Science Park 106, 1098 XG 
      Amsterdam, The Netherlands.
FAU - Wooning, E I
AU  - Wooning EI
AD  - Advanced Research Center for Nanolithography, Science Park 106, 1098 XG 
      Amsterdam, The Netherlands.
FAU - Wu, L
AU  - Wu L
AUID- ORCID: 0000000230610059
AD  - Advanced Research Center for Nanolithography, Science Park 106, 1098 XG 
      Amsterdam, The Netherlands.
FAU - Bloem, R
AU  - Bloem R
AUID- ORCID: 0000000158546733
AD  - Advanced Research Center for Nanolithography, Science Park 106, 1098 XG 
      Amsterdam, The Netherlands.
FAU - Castellanos Ortega, S
AU  - Castellanos Ortega S
AUID- ORCID: 0000000248801910
AD  - Advanced Research Center for Nanolithography, Science Park 106, 1098 XG 
      Amsterdam, The Netherlands.
FAU - Brouwer, A M
AU  - Brouwer AM
AUID- ORCID: 0000000217313869
AD  - Advanced Research Center for Nanolithography, Science Park 106, 1098 XG 
      Amsterdam, The Netherlands.
FAU - Kraus, P M
AU  - Kraus PM
AUID- ORCID: 0000000229895560
AD  - Advanced Research Center for Nanolithography, Science Park 106, 1098 XG 
      Amsterdam, The Netherlands.
LA  - eng
PT  - Journal Article
PL  - United States
TA  - Rev Sci Instrum
JT  - The Review of scientific instruments
JID - 0405571
SB  - IM
EDAT- 2021/12/03 06:00
MHDA- 2021/12/03 06:01
CRDT- 2021/12/02 05:28
PHST- 2021/12/02 05:28 [entrez]
PHST- 2021/12/03 06:00 [pubmed]
PHST- 2021/12/03 06:01 [medline]
AID - 10.1063/5.0064780 [doi]
PST - ppublish
SO  - Rev Sci Instrum. 2021 Nov 1;92(11):113004. doi: 10.1063/5.0064780.