PMID- 34998189
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20220207
IS  - 1095-7103 (Electronic)
IS  - 0021-9797 (Linking)
VI  - 612
DP  - 2022 Apr 15
TI  - The cobalt atom protection layers in-situ anchored titanium carbide with 
      controllable interlayer spacing towards stable and fast lithium ions storage.
PG  - 267-276
LID - S0021-9797(21)02309-2 [pii]
LID - 10.1016/j.jcis.2021.12.165 [doi]
AB  - MXenes are the typical ions insertion-type two-dimensional (2D) nanomaterials, 
      have attracted extensive attention in the Li(+) storage field. However, the 
      self-stacking of layered structure and the consumption of electrolyte during the 
      process of charge/discharge will limit the Li(+) diffusion dynamics, rate 
      capability and capacity of MXenes. Herein, a Co atom protection layers with 
      electrochemical nonreactivity were anchored on/in the surface/interlayer of 
      titanium carbide (Ti(3)C(2)) by in-situ thermal anchoring (x-Co/m-Ti(3)C(2), x 
       = 45, 65 and 85), which can not only avoid the self-stacking and expand the 
      interlayer spacing of Ti(3)C(2) but also reduce the consumption of Li(+) and 
      electrolyte by forming the thin solid electrolyte interphase (SEI) film. The 
      interlayer spacing of Ti(3)C(2) can be expanded from 0.98 to 1.21, 1.36 and 
      1.33 nm when the anchoring temperatures are 45, 65 and 85  degrees C due to the pillaring 
      effects of Co atom layers, in where the 65-Co/m-Ti(3)C(2) can achieve the best 
      specific capacity and rate capability attributed to its superior diffusion 
      coefficient of 8.8 x 10(-7) cm(2) s(-1) in Li(+) storage process. Furthermore, 
      the 45, 65 and 85-Co/m-Ti(3)C(2) exhibit lower SEI resistances (R(SEI)) as 
      1.45 +/- 0.01, 1.26 +/- 0.01 and 1.83 +/- 0.01 Omega compared with the R(SEI) of Ti(3)C(2) 
      (5.18 +/- 0.01 Omega), suggesting the x-Co/m-Ti(3)C(2) demonstrates a thin SEI film due 
      to the protection of Co atom layers. The findings propose a Co atom protection 
      layers with electrochemical nonreactivity, not only giving an approach to expand 
      the interlayer spacing, but also providing a protection strategy for 2D 
      nanomaterials.
CI  - Copyright (c) 2021 Elsevier Inc. All rights reserved.
FAU - Liu, Mao-Cheng
AU  - Liu MC
AD  - State Key Laboratory of Advanced Processing and Recycling of Non-ferrous Metals, 
      Lanzhou University of Technology, 287 Langongping Road, Lanzhou 730050, PR China; 
      School of Materials Science and Engineering, Lanzhou University of Technology, 
      287 Langongping Road, Lanzhou 730050, PR China. Electronic address: 
      liumc@lut.edu.cn.
FAU - Zhang, Yu-Shan
AU  - Zhang YS
AD  - State Key Laboratory of Advanced Processing and Recycling of Non-ferrous Metals, 
      Lanzhou University of Technology, 287 Langongping Road, Lanzhou 730050, PR China; 
      School of Materials Science and Engineering, Lanzhou University of Technology, 
      287 Langongping Road, Lanzhou 730050, PR China.
FAU - Zhang, Bin-Mei
AU  - Zhang BM
AD  - State Key Laboratory of Advanced Processing and Recycling of Non-ferrous Metals, 
      Lanzhou University of Technology, 287 Langongping Road, Lanzhou 730050, PR China; 
      School of Materials Science and Engineering, Lanzhou University of Technology, 
      287 Langongping Road, Lanzhou 730050, PR China.
FAU - Kong, Ling-Bin
AU  - Kong LB
AD  - State Key Laboratory of Advanced Processing and Recycling of Non-ferrous Metals, 
      Lanzhou University of Technology, 287 Langongping Road, Lanzhou 730050, PR China; 
      School of Materials Science and Engineering, Lanzhou University of Technology, 
      287 Langongping Road, Lanzhou 730050, PR China.
FAU - Hu, Yu-Xia
AU  - Hu YX
AD  - State Key Laboratory of Advanced Processing and Recycling of Non-ferrous Metals, 
      Lanzhou University of Technology, 287 Langongping Road, Lanzhou 730050, PR China; 
      School of Materials Science and Engineering, Lanzhou University of Technology, 
      287 Langongping Road, Lanzhou 730050, PR China; School of Bailie Engineering 
      &Technology, Lanzhou City University, Lanzhou 730070, PR China. Electronic 
      address: huyuxiav@163.com.
LA  - eng
PT  - Journal Article
DEP - 20211229
PL  - United States
TA  - J Colloid Interface Sci
JT  - Journal of colloid and interface science
JID - 0043125
SB  - IM
OTO - NOTNLM
OT  - Co atom protection layers
OT  - Controllable interlayer spacing
OT  - Lithium ions storage
OT  - Thin SEI film
OT  - Ti(3)C(2) MXene
COIS- Declaration of Competing Interest The authors declare that they have no known 
      competing financial interests or personal relationships that could have appeared 
      to influence the work reported in this paper.
EDAT- 2022/01/09 06:00
MHDA- 2022/01/09 06:01
CRDT- 2022/01/08 20:16
PHST- 2021/10/22 00:00 [received]
PHST- 2021/12/19 00:00 [revised]
PHST- 2021/12/24 00:00 [accepted]
PHST- 2022/01/09 06:00 [pubmed]
PHST- 2022/01/09 06:01 [medline]
PHST- 2022/01/08 20:16 [entrez]
AID - S0021-9797(21)02309-2 [pii]
AID - 10.1016/j.jcis.2021.12.165 [doi]
PST - ppublish
SO  - J Colloid Interface Sci. 2022 Apr 15;612:267-276. doi: 
      10.1016/j.jcis.2021.12.165. Epub 2021 Dec 29.