PMID- 35160649 OWN - NLM STAT- PubMed-not-MEDLINE LR - 20220219 IS - 1996-1944 (Print) IS - 1996-1944 (Electronic) IS - 1996-1944 (Linking) VI - 15 IP - 3 DP - 2022 Jan 18 TI - A Novel GaN:C Millimeter-Wave HEMT with AlGaN Electron-Blocking Layer. LID - 10.3390/ma15030703 [doi] LID - 703 AB - An AlGaN/GaN/Si high electron mobility transistor (HEMT) using a GaN:C buffer with a 2 nm AlGaN electron-blocking layer (EBL) is investigated for the first time for millimeter-wave applications. Compared with the double heterostructure field effect transistor (DHFET), the AlGaN/GaN HEMT with the GaN:C/EBL buffer has a lower vertical leakage, higher thermal stability, and better RF performance. In addition, AlGaN EBL can prevent carbon-related traps from GaN:C and improve electron confinement in 2DEG during high-frequency operation. Finally, a P(out) of 31.2 dBm with PAE of 21.7% were measured at 28 GHz at 28 V. These results demonstrated the great potential of HEMTs using GaN:C with AlGaN EBL epitaxy technology for millimeter-wave applications. FAU - Weng, You-Chen AU - Weng YC AD - College of Photonics, National Yang Ming Chiao Tung University, Tainan 71150, Taiwan. FAU - Lin, Yueh-Chin AU - Lin YC AD - Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan. FAU - Hsu, Heng-Tung AU - Hsu HT AUID- ORCID: 0000-0002-7753-5690 AD - International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan. FAU - Kao, Min-Lu AU - Kao ML AUID- ORCID: 0000-0002-6517-2220 AD - Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan. FAU - Huang, Hsuan-Yao AU - Huang HY AD - International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan. FAU - Ueda, Daisuke AU - Ueda D AD - International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan. FAU - Ha, Minh-Thien-Huu AU - Ha MT AD - Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan. FAU - Yang, Chih-Yi AU - Yang CY AD - International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan. FAU - Maa, Jer-Shen AU - Maa JS AD - College of Photonics, National Yang Ming Chiao Tung University, Tainan 71150, Taiwan. FAU - Chang, Edward-Yi AU - Chang EY AD - Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan. AD - International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan. AD - Department of Electronics Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan. FAU - Dee, Chang-Fu AU - Dee CF AUID- ORCID: 0000-0003-1015-9181 AD - Institute of Microengineering and Nanoelectronics (IMEN), University Kebangsaan Malaysia, Level 4, Research Complex, Bangi 43600, Malaysia. LA - eng PT - Journal Article DEP - 20220118 PL - Switzerland TA - Materials (Basel) JT - Materials (Basel, Switzerland) JID - 101555929 PMC - PMC8836704 OTO - NOTNLM OT - GaN OT - HEMT OT - electron-blocking layer COIS- The authors declare no conflict of interest. EDAT- 2022/02/16 06:00 MHDA- 2022/02/16 06:01 PMCR- 2022/01/18 CRDT- 2022/02/15 01:08 PHST- 2021/11/28 00:00 [received] PHST- 2022/01/12 00:00 [revised] PHST- 2022/01/13 00:00 [accepted] PHST- 2022/02/15 01:08 [entrez] PHST- 2022/02/16 06:00 [pubmed] PHST- 2022/02/16 06:01 [medline] PHST- 2022/01/18 00:00 [pmc-release] AID - ma15030703 [pii] AID - materials-15-00703 [pii] AID - 10.3390/ma15030703 [doi] PST - epublish SO - Materials (Basel). 2022 Jan 18;15(3):703. doi: 10.3390/ma15030703.