PMID- 35334756 OWN - NLM STAT- PubMed-not-MEDLINE LR - 20220328 IS - 2072-666X (Print) IS - 2072-666X (Electronic) IS - 2072-666X (Linking) VI - 13 IP - 3 DP - 2022 Mar 18 TI - A Novel AlGaN/Si(3)N(4) Compound Buffer Layer HEMT with Improved Breakdown Performances. LID - 10.3390/mi13030464 [doi] LID - 464 AB - In this article, an AlGaN and Si(3)N(4) compound buffer layer high electron mobility transistor (HEMT) is proposed and analyzed through TCAD simulations. In the proposed HEMT, the Si(3)N(4) insulating layer is partially buried between the AlGaN buffer layer and AlN nucleating layer, which introduces a high electric field from the vertical field plate into the internal buffer region of the device. The compound buffer layer can significantly increase the breakdown performance without sacrificing any dynamic characteristics and increasing the difficulty in the fabrication process. The significant structural parameters are optimized and analyzed. The simulation results reveal that the proposed HEMT with a 6 mum gate-drain distance shows an OFF-state breakdown voltage (BV) of 881 V and a specific ON-state resistance (R(on,sp)) of 3.27 mOmega.cm(2). When compared with the conventional field plate HEMT and drain connected field plate HEMT, the breakdown voltage could be increased by 148% and 94%, respectively. FAU - Guo, Jingwei AU - Guo J AUID- ORCID: 0000-0002-2600-577X AD - Chongqing Engineering Laboratory of High Performance Integrated Circuits, School of Microelectronics and Communication Engineering, Chongqing University, Chongqing 400044, China. FAU - Hu, Shengdong AU - Hu S AD - Chongqing Engineering Laboratory of High Performance Integrated Circuits, School of Microelectronics and Communication Engineering, Chongqing University, Chongqing 400044, China. FAU - Li, Ping AU - Li P AD - Chongqing Engineering Laboratory of High Performance Integrated Circuits, School of Microelectronics and Communication Engineering, Chongqing University, Chongqing 400044, China. AD - China Resources Microelectronics (Chongqing) Limited, Chongqing 401332, China. FAU - Jiang, Jie AU - Jiang J AD - Chongqing Engineering Laboratory of High Performance Integrated Circuits, School of Microelectronics and Communication Engineering, Chongqing University, Chongqing 400044, China. FAU - Wang, Ruoyu AU - Wang R AD - Chongqing Engineering Laboratory of High Performance Integrated Circuits, School of Microelectronics and Communication Engineering, Chongqing University, Chongqing 400044, China. FAU - Wang, Yuan AU - Wang Y AD - Chongqing Engineering Laboratory of High Performance Integrated Circuits, School of Microelectronics and Communication Engineering, Chongqing University, Chongqing 400044, China. FAU - Wu, Hao AU - Wu H AD - Chongqing Engineering Laboratory of High Performance Integrated Circuits, School of Microelectronics and Communication Engineering, Chongqing University, Chongqing 400044, China. LA - eng GR - 62174017/National Natural Science Foundation of China/ GR - cstc2020jcyj-msxmX0243/Natural Science Foundation Project of CQ CSTC/ GR - 2020CDJ-LHZZ-024/Fundamental Research Funds for the Central Universities/ PT - Journal Article DEP - 20220318 PL - Switzerland TA - Micromachines (Basel) JT - Micromachines JID - 101640903 PMC - PMC8949781 OTO - NOTNLM OT - AlGaN/GaN HEMT OT - breakdown voltage OT - buffer layer OT - electric field COIS- The authors declare no conflict of interest. EDAT- 2022/03/27 06:00 MHDA- 2022/03/27 06:01 PMCR- 2022/03/18 CRDT- 2022/03/26 01:01 PHST- 2022/02/12 00:00 [received] PHST- 2022/03/10 00:00 [revised] PHST- 2022/03/14 00:00 [accepted] PHST- 2022/03/26 01:01 [entrez] PHST- 2022/03/27 06:00 [pubmed] PHST- 2022/03/27 06:01 [medline] PHST- 2022/03/18 00:00 [pmc-release] AID - mi13030464 [pii] AID - micromachines-13-00464 [pii] AID - 10.3390/mi13030464 [doi] PST - epublish SO - Micromachines (Basel). 2022 Mar 18;13(3):464. doi: 10.3390/mi13030464.