PMID- 35407795
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20220419
IS  - 1996-1944 (Print)
IS  - 1996-1944 (Electronic)
IS  - 1996-1944 (Linking)
VI  - 15
IP  - 7
DP  - 2022 Mar 27
TI  - Microstructure and Antimicrobial Properties of Zr-Cu-Ti Thin-Film Metallic Glass 
      Deposited Using High-Power Impulse Magnetron Sputtering.
LID - 10.3390/ma15072461 [doi]
LID - 2461
AB  - Zr-Cu based thin-film metallic glass (TFMG) has good glass-forming ability and 
      the addition of a third element can create a chaotic system capable of inhibiting 
      the nucleation and growth of crystals. This study focused on TFMGs made with Zr, 
      Cu, and Ti in various compositions deposited via high-impulse magnetron 
      sputtering on silicon and 304 stainless-steel substrates. Detailed analysis was 
      performed on the microstructure and surface characteristics of the resulting 
      coatings. Transmission electron microscopy revealed that the multilayer structure 
      changed to a nanocrystalline structure similar to an amorphous coating. The 
      excellent hydrophobicity of Zr-Cu-Ti TFMGs can be attributed to their 
      ultra-smooth surface without any grain boundaries. The excellent antimicrobial 
      effects can be attributed to a hydrophobic surface resisting cell adhesion and 
      the presence of copper ions, which are lethal to microbes.
FAU - Tang, Jian-Fu
AU  - Tang JF
AD  - Department of Electro-Optical Engineering, National Taipei University of 
      Technology, Taipei City 106, Taiwan.
FAU - Huang, Po-Yuan
AU  - Huang PY
AD  - Department of Materials Engineering, Ming Chi University of Technology, New 
      Taipei City 243, Taiwan.
FAU - Lin, Ja-Hon
AU  - Lin JH
AUID- ORCID: 0000-0003-3271-7033
AD  - Department of Electro-Optical Engineering, National Taipei University of 
      Technology, Taipei City 106, Taiwan.
FAU - Liu, Ting-Wei
AU  - Liu TW
AD  - Department of Materials Engineering, Ming Chi University of Technology, New 
      Taipei City 243, Taiwan.
FAU - Yang, Fu-Chi
AU  - Yang FC
AD  - Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, 
      New Taipei City 243, Taiwan.
FAU - Chang, Chi-Lung
AU  - Chang CL
AUID- ORCID: 0000-0003-2448-1163
AD  - Department of Materials Engineering, Ming Chi University of Technology, New 
      Taipei City 243, Taiwan.
AD  - Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, 
      New Taipei City 243, Taiwan.
LA  - eng
GR  - MOST 109-2221-E-131-019, MOST 109-2622-E-131- 003-CC3, MOST 110-2221-E-131-006 
      and MOST 110-2222-E-027-008- MY3./Ministry of Science and Technology Taiwan/
PT  - Journal Article
DEP - 20220327
PL  - Switzerland
TA  - Materials (Basel)
JT  - Materials (Basel, Switzerland)
JID - 101555929
PMC - PMC8999468
OTO - NOTNLM
OT  - TFMGs
OT  - ZrCuTi
OT  - antimicrobial effect
OT  - multilayer
OT  - nanocrystalline
COIS- The authors declare no conflict of interest.
EDAT- 2022/04/13 06:00
MHDA- 2022/04/13 06:01
PMCR- 2022/03/27
CRDT- 2022/04/12 01:08
PHST- 2022/03/07 00:00 [received]
PHST- 2022/03/25 00:00 [revised]
PHST- 2022/03/25 00:00 [accepted]
PHST- 2022/04/12 01:08 [entrez]
PHST- 2022/04/13 06:00 [pubmed]
PHST- 2022/04/13 06:01 [medline]
PHST- 2022/03/27 00:00 [pmc-release]
AID - ma15072461 [pii]
AID - materials-15-02461 [pii]
AID - 10.3390/ma15072461 [doi]
PST - epublish
SO  - Materials (Basel). 2022 Mar 27;15(7):2461. doi: 10.3390/ma15072461.