PMID- 35559149
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20220516
IS  - 2470-1343 (Electronic)
IS  - 2470-1343 (Linking)
VI  - 7
IP  - 16
DP  - 2022 Apr 26
TI  - Evaluation of Three Sample Introduction Systems for Impurity Analysis of an 
      Ultrapure Reagent Using a Scanning Mobility Particle Sizer.
PG  - 13622-13628
LID - 10.1021/acsomega.1c07168 [doi]
AB  - The semiconductor industry continues to shrink the device sizes while applying 
      more complex shapes and using diverse materials, which requires parallel 
      improvements in the quality of ultrapure reagents. The need for ultrapure 
      reagents has led to ever-higher demands for the performance of analytical 
      instruments used to detect ultratrace impurities. In this study, nonvolatile 
      impurities in ultrapure reagents were quantified using a scanning mobility 
      particle sizer (SMPS). The performances of three different sample introduction 
      systems, i.e., an electrospray (ES), an aerosol generator with a heating chamber 
      and a Nafion desolvation membrane (NB-II), and a MicroMist nebulizer with a 
      heated cyclonic spray chamber and a three-stage Peltier-cooled desolvation system 
      (MM-APEX), were evaluated for the lower limit of detection of a SMPS. The MM-APEX 
      equipped with the SMPS was able to detect NaCl additives at a concentration of 
      100 parts per trillion (ppt, ng/L) in ultrapure water, which was approximately 
      10(4)- and 10(2)-fold lower than those of ES and NB-II, respectively. The 
      practical application of MM-APEX with the SMPS for commercial isopropanol samples 
      was also studied. The results clearly demonstrate that the impurity 
      concentrations presented by the NaCl-equivalent concentrations among different 
      sources of isopropanol were at the ppt to parts-to-billion (ppb) scale. The SMPS 
      system equipped with MM-APEX is capable of recognizing impurities with 
      concentrations ranging from tens ppt to thousands of parts per million (ppm), 
      which is beneficial for an ultratrace analysis of nonvolatile impurities in 
      semiconductor process chemicals.
CI  - (c) 2022 The Authors. Published by American Chemical Society.
FAU - Chang, Alice Chinghsuan
AU  - Chang AC
AD  - Center for Measurement Standards, Industrial Technology Research Institute, 
      Hsinchu 30011, Taiwan.
FAU - Hung, Shu-Han
AU  - Hung SH
AD  - Center for Measurement Standards, Industrial Technology Research Institute, 
      Hsinchu 30011, Taiwan.
FAU - Pan, Yi-Hsuan
AU  - Pan YH
AD  - Center for Measurement Standards, Industrial Technology Research Institute, 
      Hsinchu 30011, Taiwan.
FAU - Liu, Yi-Hung
AU  - Liu YH
AD  - Center for Measurement Standards, Industrial Technology Research Institute, 
      Hsinchu 30011, Taiwan.
FAU - Fu, Wei-En
AU  - Fu WE
AD  - Center for Measurement Standards, Industrial Technology Research Institute, 
      Hsinchu 30011, Taiwan.
FAU - Lin, Yu-Ju
AU  - Lin YJ
AD  - Research & Marketing Laboratory in Taiwan, Tokuyama Corporation, Hsinchu 31057, 
      Taiwan.
FAU - Lin, Fang-Hsin
AU  - Lin FH
AUID- ORCID: 0000-0001-7543-2885
AD  - Center for Measurement Standards, Industrial Technology Research Institute, 
      Hsinchu 30011, Taiwan.
LA  - eng
PT  - Journal Article
DEP - 20220415
PL  - United States
TA  - ACS Omega
JT  - ACS omega
JID - 101691658
PMC - PMC9088961
COIS- The authors declare no competing financial interest.
EDAT- 2022/05/14 06:00
MHDA- 2022/05/14 06:01
PMCR- 2022/04/15
CRDT- 2022/05/13 18:23
PHST- 2021/12/20 00:00 [received]
PHST- 2022/04/05 00:00 [accepted]
PHST- 2022/05/13 18:23 [entrez]
PHST- 2022/05/14 06:00 [pubmed]
PHST- 2022/05/14 06:01 [medline]
PHST- 2022/04/15 00:00 [pmc-release]
AID - 10.1021/acsomega.1c07168 [doi]
PST - epublish
SO  - ACS Omega. 2022 Apr 15;7(16):13622-13628. doi: 10.1021/acsomega.1c07168. 
      eCollection 2022 Apr 26.