PMID- 35630258
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20220716
IS  - 2072-666X (Print)
IS  - 2072-666X (Electronic)
IS  - 2072-666X (Linking)
VI  - 13
IP  - 5
DP  - 2022 May 19
TI  - Investigation on the Effect of Annealing Temperature on the Side Ohmic Contact 
      Characteristics for Double Channel GaN/AlGaN Epitaxial Layer.
LID - 10.3390/mi13050791 [doi]
LID - 791
AB  - A side ohmic contact mode for the double channel GaN/AlGaN epitaxial layer is 
      proposed in this paper. Rectangle transmission line model (TLM) electrodes are 
      prepared, and the specific contact resistance is tested at the annealing 
      temperatures from 700  degrees C to 850  degrees C. The results show that the minimum specific 
      contact resistance is 2.58 x 10(-7) Omega.cm(2) at the annealing temperature of 750 
       degrees C, which is three to four times lower than the surface contact mode. Scanning 
      electron microscope (SEM), energy dispersive spectrometer (EDS), and atomic force 
      microscope (AFM) were carried out for the analysis of the morphology, element 
      composition, and the height fluctuation at the contact edge. With the increase in 
      the annealing temperature, the specific contact resistance decreases due to the 
      alloying of electrodes and the raised number of N vacancies. However, when the 
      annealing temperature exceeds 800  degrees C, the state of the stress in the electrode 
      films transforms from compressive stress to tensile stress. Besides, the volume 
      expansion of metal electrode film and the increase in the roughness at the 
      contact edge leads to the degradation of the side ohmic contact characteristics.
FAU - Meng, Qingzhi
AU  - Meng Q
AD  - State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong 
      University, Xi'an 710049, China.
FAU - Lin, Qijing
AU  - Lin Q
AD  - State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong 
      University, Xi'an 710049, China.
AD  - Collaborative Innovation Center of High-End Manufacturing Equipment, Xi'an 
      Jiaotong University, Xi'an 710054, China.
AD  - School of Mechanical and Manufacturing Engineering, Xiamen Institute of 
      Technology, Xiamen 361021, China.
AD  - Chongqing Key Laboratory of Micro-Nano Systems and Intelligent Sensing, Chongqing 
      Academician Workstation, Chongqing 2011 Collaborative Innovation Center of 
      Micro/Nano Sensing and Intelligent Ecological Internet of Things, Chongqing 
      Technology and Business University, Chongqing 400067, China.
FAU - Jing, Weixuan
AU  - Jing W
AD  - State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong 
      University, Xi'an 710049, China.
FAU - Zhao, Na
AU  - Zhao N
AUID- ORCID: 0000-0002-9113-4615
AD  - State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong 
      University, Xi'an 710049, China.
FAU - Yang, Ping
AU  - Yang P
AD  - State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong 
      University, Xi'an 710049, China.
FAU - Lu, Dejiang
AU  - Lu D
AD  - State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong 
      University, Xi'an 710049, China.
LA  - eng
GR  - 2021YFB3201800/National Key Research and Development Program/
GR  - 51720105016/National Natural Science Foundation of China/
GR  - cstc2021jcyjmsxmX0223/Natural Science Foundation of Chongqing City/
PT  - Journal Article
DEP - 20220519
PL  - Switzerland
TA  - Micromachines (Basel)
JT  - Micromachines
JID - 101640903
PMC - PMC9147089
OTO - NOTNLM
OT  - annealing temperatures
OT  - side ohmic contact
OT  - specific contact resistance
OT  - transmission line model
COIS- The authors declare no conflict of interest.
EDAT- 2022/05/29 06:00
MHDA- 2022/05/29 06:01
PMCR- 2022/05/19
CRDT- 2022/05/28 01:32
PHST- 2022/04/03 00:00 [received]
PHST- 2022/05/14 00:00 [revised]
PHST- 2022/05/16 00:00 [accepted]
PHST- 2022/05/28 01:32 [entrez]
PHST- 2022/05/29 06:00 [pubmed]
PHST- 2022/05/29 06:01 [medline]
PHST- 2022/05/19 00:00 [pmc-release]
AID - mi13050791 [pii]
AID - micromachines-13-00791 [pii]
AID - 10.3390/mi13050791 [doi]
PST - epublish
SO  - Micromachines (Basel). 2022 May 19;13(5):791. doi: 10.3390/mi13050791.