PMID- 36070441
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20220928
IS  - 1944-8252 (Electronic)
IS  - 1944-8244 (Print)
IS  - 1944-8244 (Linking)
VI  - 14
IP  - 37
DP  - 2022 Sep 21
TI  - Edge-Contact MoS(2) Transistors Fabricated Using Thermal Scanning Probe 
      Lithography.
PG  - 42328-42336
LID - 10.1021/acsami.2c10150 [doi]
AB  - The science and engineering of two-dimensional materials (2DMs), in particular, 
      of 2D semiconductors, is advancing at a thriving pace. It is well known that 
      these delicate few-atoms thick materials can be damaged during the processing 
      toward their integration into final devices. Thermal scanning probe lithography 
      (t-SPL) is a gentle alternative to the typically used electron beam lithography 
      to fabricate these devices avoiding the use of electrons, which are well known to 
      deteriorate the 2DMs' properties. Here, t-SPL is used for the fabrication of 
      MoS(2)-based field effect transistors (FETs). In particular, the use of t-SPL is 
      demonstrated for the first time for the fabrication of edge-contact MoS(2) FETs, 
      combining the hot-tip patterning and Ar(+) milling to etch the 2DM. To avoid 
      contamination of the contact interface by atmospheric gas molecules, etching and 
      metal deposition are performed without breaking the vacuum conditions in between. 
      With this process, edge-contact MoS(2) FETs are successfully fabricated and 
      characterized. On/off ratios up to 10(8) and 10(9) are obtained at room 
      temperature in air and vacuum, respectively, i.e., comparable with the best 
      values reported in the literature.
FAU - Conde-Rubio, Ana
AU  - Conde-Rubio A
AUID- ORCID: 0000-0001-5739-2189
AD  - Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne (EPFL), 1015 
      Lausanne, Switzerland.
FAU - Liu, Xia
AU  - Liu X
AUID- ORCID: 0000-0003-1886-6825
AD  - Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne (EPFL), 1015 
      Lausanne, Switzerland.
FAU - Boero, Giovanni
AU  - Boero G
AD  - Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne (EPFL), 1015 
      Lausanne, Switzerland.
FAU - Brugger, Jurgen
AU  - Brugger J
AUID- ORCID: 0000-0002-7710-5930
AD  - Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne (EPFL), 1015 
      Lausanne, Switzerland.
LA  - eng
PT  - Journal Article
DEP - 20220907
PL  - United States
TA  - ACS Appl Mater Interfaces
JT  - ACS applied materials & interfaces
JID - 101504991
SB  - IM
PMC - PMC9501915
OTO - NOTNLM
OT  - 2D materials
OT  - FET
OT  - MoS2
OT  - TMDCs
OT  - edge contact
OT  - lithography
OT  - thermal scanning probe
COIS- The authors declare no competing financial interest.
EDAT- 2022/09/08 06:00
MHDA- 2022/09/08 06:01
PMCR- 2022/09/23
CRDT- 2022/09/07 14:53
PHST- 2022/09/08 06:00 [pubmed]
PHST- 2022/09/08 06:01 [medline]
PHST- 2022/09/07 14:53 [entrez]
PHST- 2022/09/23 00:00 [pmc-release]
AID - 10.1021/acsami.2c10150 [doi]
PST - ppublish
SO  - ACS Appl Mater Interfaces. 2022 Sep 21;14(37):42328-42336. doi: 
      10.1021/acsami.2c10150. Epub 2022 Sep 7.