PMID- 38391021
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20240223
IS  - 1089-7690 (Electronic)
IS  - 0021-9606 (Linking)
VI  - 160
IP  - 8
DP  - 2024 Feb 28
TI  - A simple fabrication of liquid-like polydimethylsiloxane coating for resisting 
      ice adhesion.
LID - 084703 [pii]
LID - 10.1063/5.0188199 [doi]
AB  - The rapid realization of efficient anti-icing coatings on diverse substrates is 
      of vital value for practical applications. However, current approaches for rapid 
      preparations of anti-icing coatings are still deficient regarding their surface 
      universality and accessibility. Here, we report a simple processing approach to 
      rapidly form icephobic liquid-like polydimethylsiloxane (PDMS) brushes on various 
      substrates, including metals, ceramics, glass, and plastics. A 
      poly(dimethylsiloxane), trimethoxysilane is applied as a reactant under the 
      catalysis of a minimal amount of acid formed by hydrolysis of 
      dichlorodimethylsilane. With such an advantage, this approach is approved to be 
      applicable of coating metal surfaces with less corrosion. The distinctive 
      flexibility of the PDMS chains provides a liquid-like property to the coating 
      showing low contact angle hysteresis and ice adhesion strength. Notably, the ice 
      adhesion strength remains similar across a wide temperature window, from -70 to 
      -10  degrees C, with a value of 18.4 kPa. The PDMS brushes demonstrate perfect capability 
      for resisting acid and alkali corrosions, ultra-violet degradation, and even tens 
      of icing/deicing cycles. Moreover, the liquid-like coating can also form at 
      supercooling conditions, such as -20  degrees C, and shows an outstanding 
      anti-icing/deicing performance, which meets the in situ coating reformation 
      requirement under extreme conditions when it is damaged. This instantly forming 
      anti-icing material will benefit from resisting instantaneous ice accretion on 
      surfaces under extremely cold conditions.
CI  - (c) 2024 Author(s). Published under an exclusive license by AIP Publishing.
FAU - Zhang, Yixuan
AU  - Zhang Y
AUID- ORCID: 0009-0008-6288-7168
AD  - School of Materials Science and Engineering, Zhengzhou University, Zhengzhou 
      450001, People's Republic of China.
AD  - Key Laboratory of Green Printing, Institute of Chemistry, Chinese Academy of 
      Sciences, Beijing 100190, People's Republic of China.
FAU - Wang, Lei
AU  - Wang L
AUID- ORCID: 0009-0009-6105-7880
AD  - Key Laboratory of Green Printing, Institute of Chemistry, Chinese Academy of 
      Sciences, Beijing 100190, People's Republic of China.
AD  - School of Chemical Sciences, University of Chinese Academy of Sciences, Beijing 
      100049, People's Republic of China.
FAU - Zhao, Xueying
AU  - Zhao X
AUID- ORCID: 0009-0002-5249-5896
AD  - Key Laboratory of Green Printing, Institute of Chemistry, Chinese Academy of 
      Sciences, Beijing 100190, People's Republic of China.
AD  - School of Chemical Sciences, University of Chinese Academy of Sciences, Beijing 
      100049, People's Republic of China.
FAU - Yang, Huige
AU  - Yang H
AUID- ORCID: 0000-0001-8004-6401
AD  - School of Materials Science and Engineering, Zhengzhou University, Zhengzhou 
      450001, People's Republic of China.
FAU - Liu, Jie
AU  - Liu J
AUID- ORCID: 0000-0003-0153-7515
AD  - Key Laboratory of Green Printing, Institute of Chemistry, Chinese Academy of 
      Sciences, Beijing 100190, People's Republic of China.
AD  - School of Chemical Sciences, University of Chinese Academy of Sciences, Beijing 
      100049, People's Republic of China.
FAU - Wang, Jianjun
AU  - Wang J
AUID- ORCID: 0000-0002-1704-9922
AD  - School of Chemical Sciences, University of Chinese Academy of Sciences, Beijing 
      100049, People's Republic of China.
AD  - Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, 
      Beijing 100049, People's Republic of China.
LA  - eng
PT  - Journal Article
PL  - United States
TA  - J Chem Phys
JT  - The Journal of chemical physics
JID - 0375360
SB  - IM
EDAT- 2024/02/23 12:43
MHDA- 2024/02/23 12:44
CRDT- 2024/02/23 08:04
PHST- 2023/11/20 00:00 [received]
PHST- 2024/02/05 00:00 [accepted]
PHST- 2024/02/23 12:44 [medline]
PHST- 2024/02/23 12:43 [pubmed]
PHST- 2024/02/23 08:04 [entrez]
AID - 3267206 [pii]
AID - 10.1063/5.0188199 [doi]
PST - ppublish
SO  - J Chem Phys. 2024 Feb 28;160(8):084703. doi: 10.1063/5.0188199.