PMID- 38524526
OWN - NLM
STAT- PubMed-not-MEDLINE
LR  - 20240326
IS  - 2405-8440 (Print)
IS  - 2405-8440 (Electronic)
IS  - 2405-8440 (Linking)
VI  - 10
IP  - 6
DP  - 2024 Mar 30
TI  - Deposition of ZnO thin films with different powers using RF magnetron sputtering 
      method: Structural, electrical and optical study.
PG  - e27606
LID - 10.1016/j.heliyon.2024.e27606 [doi]
LID - e27606
AB  - Zinc Oxide thin films at room temperature with good crystallinity quality have 
      been deposited at different Radio Frequency powers. Magnetron sputtering 
      technique has been carried out on glass and oriented Si(100) substrates. The film 
      structure has been characterized by X-ray Diffraction (XRD) and MicroRaman 
      spectroscopy, which possesses a wurtzite structure with (002) preferential 
      orientation selecting suitable conditions. Scanning electron microscope (SEM) and 
      atomic force microscopy (AFM) have been utilized to determine the films surface 
      morphology. The stoichiometry has been verified by Energy dispersive X-ray 
      spectroscopy (EDX) analysis. The optical behaviors of the deposited films have 
      been characterized by Ultraviolet Visible (UV-Vis) (optical transmittance 
      measurements) as well as by Photoluminance characterization. Electrical 
      properties, Current-Voltage (I-V) and Capacitance-Voltage (C-V) have been studied 
      in details for Zinc Oxide on Silicon film that deposited at different Radio 
      Frequency power. The high transparency, electrical behavior and smooth surface 
      allow to use these Zinc Oxide films in photovoltaic cells and optoelectronics 
      application.
CI  - (c) 2024 The Authors. Published by Elsevier Ltd.
FAU - Abdallah, Bassam
AU  - Abdallah B
AD  - Department of Physics, Atomic Energy Commission, P. O. Box 6091, Damascus, Syria.
FAU - Zetoun, Walaa
AU  - Zetoun W
AD  - Department of Physics, Atomic Energy Commission, P. O. Box 6091, Damascus, Syria.
FAU - Tello, Ahamad
AU  - Tello A
AD  - Department of Physics, Atomic Energy Commission, P. O. Box 6091, Damascus, Syria.
LA  - eng
PT  - Journal Article
DEP - 20240314
PL  - England
TA  - Heliyon
JT  - Heliyon
JID - 101672560
PMC - PMC10958213
OTO - NOTNLM
OT  - Electrical measurement
OT  - Optical and structural characteristics
OT  - RF magnetron sputtering
OT  - ZnO films
COIS- The authors declare that they have no known competing financial interests or 
      personal relationships that could have appeared to influence the work reported in 
      this paper.
EDAT- 2024/03/25 06:43
MHDA- 2024/03/25 06:44
PMCR- 2024/03/14
CRDT- 2024/03/25 04:27
PHST- 2024/01/11 00:00 [received]
PHST- 2024/02/29 00:00 [revised]
PHST- 2024/03/04 00:00 [accepted]
PHST- 2024/03/25 06:44 [medline]
PHST- 2024/03/25 06:43 [pubmed]
PHST- 2024/03/25 04:27 [entrez]
PHST- 2024/03/14 00:00 [pmc-release]
AID - S2405-8440(24)03637-5 [pii]
AID - e27606 [pii]
AID - 10.1016/j.heliyon.2024.e27606 [doi]
PST - epublish
SO  - Heliyon. 2024 Mar 14;10(6):e27606. doi: 10.1016/j.heliyon.2024.e27606. 
      eCollection 2024 Mar 30.